SCHEMBL6566253

SCHEMBL6566253

O=C(O)COc1ccc2cc(C(=O)O)ccc2c1

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN7 P35236 1/20 0.69
KDM4E B2RXH2 2/20 0.61
MEN1 O00255 2/20 0.56
KMT2A Q03164 2/20 0.56
TDP1 Q9NUW8 1/20 0.51
MRGPRX4 Q96LA9 1/20 0.51
ALOX15 P16050 2/20 0.50
HSD17B10 Q99714 2/20 0.50
TSHR P16473 1/20 0.50
MCL1 Q07820 1/20 0.50
LMNA P02545 1/20 0.49
CA2 P00918 1/20 0.48
ALDH1A1 P00352 2/20 0.47
CYP1A2 P05177 1/20 0.47
HPGD P15428 1/20 0.47
CYP2C19 P33261 1/20 0.47
PLA2G4B P0C869 1/20 0.47
PDE2A O00408 1/20 0.47
PDE3B Q13370 1/20 0.47
PDE3A Q14432 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6566344 0.97 PTPN7 (0.70) PTPN7KDM4EMEN1KMT2ATDP1
SCHEMBL4076964 0.89 PTPN7 (0.85) PTPN7KDM4EMEN1KMT2ATDP1
SCHEMBL30726463 0.85 KDM4E (0.65) KDM4EMRGPRX4TSHRPLA2G4B
SCHEMBL465181 0.85 KDM4E (0.65) KDM4EMRGPRX4TSHRPLA2G4B
SCHEMBL465148 0.85 KDM4E (0.65) KDM4EKMT2AMRGPRX4TSHRPLA2G4B
SCHEMBL8081564 0.84 KDM4E (0.62) KDM4ETSHRPLA2G4B
SCHEMBL8072436 0.84 KDM4E (0.62) KDM4ETSHRPLA2G4B
SCHEMBL8084863 0.84 KDM4E (0.62) KDM4ETSHRPLA2G4B
SCHEMBL8084842 0.84 KDM4E (0.62) KDM4ETSHRPLA2G4B
SCHEMBL8082008 0.84 KDM4E (0.62) KDM4ETSHRPLA2G4B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6238842-B1 SUITABLE FOR USE WITH AN EXPOSURE LIGHT HAVING A WAVELENGTH OF 250 NM OR SHORTER, ESPECIALLY 220 NM OR SHORTER; ACID GENERATING COMPOUND; RESIN HAVING MONOVALENT POLYALICYCLIC GROUPS FUJI PHOTO FILM CO., LTD. (JP) 2001-05-29 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed