Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3967796 | 0.80 | — | — | |
| SCHEMBL4468805 | 0.78 | — | — | |
| SCHEMBL7053541 | 0.78 | — | — | |
| SCHEMBL6220747 | 0.78 | — | — | |
| SCHEMBL7052687 | 0.77 | — | — | |
| SCHEMBL7054076 | 0.77 | — | — | |
| SCHEMBL7055275 | 0.77 | — | — | |
| Hydrochloric Acid SCHEMBL6832813 | 0.75 | — | — | |
| Hydrochloric Acid SCHEMBL6567088 | 0.75 | — | — | |
| Hydrochloric Acid SCHEMBL7643648 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0962474-B1 | Propylene block copolymer and resin composition | JAPAN POLYCHEM CORP (JP) | 2004-04-07 | — | — | EP | disclosed |
| US-6469100-B2 | COORDINATION CATALYST | JAPAN POLYCHEM CORPORATION (JP) | 2002-10-22 | — | — | US | disclosed |
| US-20010014719-A1 | PROPYLENE BLOCK COPOLYMER AND RESIN COMPOSITION | JAPAN POLYCHEM CORPORATION (JP) | 2001-08-16 | — | — | US | disclosed |
| EP-0962474-A1 | Propylene block copolymer and resin composition | Japan Polychem Corporation (JP) | 1999-12-08 | — | — | EP | disclosed |