SCHEMBL6570219

SCHEMBL6570219

O=C(O)CC(O)(C(=O)O)S(=O)(=O)O

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.46
HMGCR P04035 1/20 0.40
CHRM1 P11229 1/20 0.40
TBXA2R P21731 1/20 0.40
ADRA1A P35348 1/20 0.40
CYP2D6 P10635 1/20 0.39
TSHR P16473 1/20 0.39
CYP2C19 P33261 1/20 0.39
HIF1A Q16665 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
ACLY P53396 3/20 0.38
CPT2 P23786 2/20 0.37
POLB P06746 1/20 0.32
KDM4E B2RXH2 1/20 0.30
FFAR1 O14842 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Styrene SCHEMBL5632820 0.78 ALDH1A1 (0.42) ALDH1A1TSHRCYP2C19HIF1ATDP1
SCHEMBL27549264 0.75 ALDH1A1 (0.39) ALDH1A1L3MBTL1
SCHEMBL9954282 0.73 ALDH1A1 (0.37) ALDH1A1L3MBTL1
SCHEMBL6561842 0.72 ALDH1A1 (0.42) ALDH1A1HMGCRCHRM1TBXA2RADRA1A
SCHEMBL1129741 0.72 ALDH1A1 (0.42) ALDH1A1HMGCRCHRM1TBXA2RADRA1A
Citric Acid SCHEMBL3825579 0.72 ALDH1A1 (0.79) ALDH1A1HMGCRCHRM1TBXA2RADRA1A
SCHEMBL3958811 0.71 ALDH1A1 (0.36) ALDH1A1TSHRCYP2C19L3MBTL1
Ammonia Solution, Strong SCHEMBL11776041 0.70 ALDH1A1 (0.40) ALDH1A1HMGCRCHRM1TBXA2RADRA1A
SCHEMBL2521500 0.70 ALDH1A1 (0.40) ALDH1A1HMGCRCHRM1TBXA2RADRA1A
SCHEMBL28489478 0.70 ALDH1A1 (0.40) ALDH1A1HMGCRCHRM1TBXA2RADRA1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105665036-A Method for additionally impregnating active component for regeneration of denitration catalyst 大唐南京环保科技有限责任公司 2016-06-15 CN claimed
CN-101098940-A Hydrophobic, salt-like structured silicate CLARIANT GMBH (DE) 2008-01-02 CN claimed
JP-11147839-A None JP disclosed
US-20240287332-A1 Dispersant-Containing Liquid And Aqueous Coloring Material Dispersion Liquid SEIKO EPSON CORPORATION (JP) 2024-08-29 US disclosed
US-20240279499-A1 Dispersant-Containing Liquid And Aqueous Coloring Material Dispersion Liquid SEIKO EPSON CORPORATION (JP) 2024-08-22 US disclosed
CN-117562992-A Anti-human VISTA antibodies and uses thereof 伊穆奈克斯特股份有限公司 2024-02-20 CN disclosed
US-20240010857-A1 Dispersant-Containing Liquid And Dispersion SEIKO EPSON CORPORATION (JP) 2024-01-11 US disclosed
US-20240010862-A1 Dispersant-Containing Liquid And Dispersion SEIKO EPSON CORPORATION (JP) 2024-01-11 US disclosed
CN-117343576-A Dispersing agent-containing liquid and dispersion 精工爱普生株式会社 2024-01-05 CN disclosed
CN-115382900-A Method for leaching and repairing heavy metal contaminated soil by using thiomalic acid 成都理工大学 2022-11-25 CN disclosed
CN-114000348-B Silver-plated conductive fabric and preparation method and application thereof 华南理工大学 2022-08-12 CN disclosed
US-6251175-B1 Jet ink composition MARCONI DATA SYSTEMS INC. 2001-06-26 US disclosed
EP-0928321-A1 BINDER RESINS FOR INK COMPOSITIONS VIDEOJET SYSTEMS INTERNATIONAL, INC. (US) 1999-07-14 EP disclosed
JP-H11147839-A HEXANONYLLYSINE ANTIBODY, ITS PRODUCTION, ANTIGEN USED THEREFOR AND ITS PRODUCTION NIKKEN FOOD CO LTD 1999-06-02 JP disclosed
CN-1215737-A Polythiol, process for producing same, sulfur-containing urethane-base resin prepared from polythiol, process for producing the resin, and lens MITSUI TOATSU CHEMICALS (JP) 1999-05-05 CN disclosed
CN-1041917-C Polythiol, process for producing the same, sulfur-containing polyurethane-based resin obtained therefrom, process for producing the same, and lens MITSUI CHEMICALS INC (JP) 1999-02-03 CN disclosed
WO-1998013430-A1 BINDER RESINS FOR INK COMPOSITIONS VIDEOJET SYSTEMS INTERNATIONAL, INC. (US) 1998-04-02 WO disclosed
CN-1111619-A Polythiol, process for producing the same, sulfur-containing polyurethane-based resin obtained therefrom, process for producing the same, and lens MITSUI TOATSU CHEMICALS (JP) 1995-11-15 CN disclosed
CN-1089135-A Agent for treatment of hair HENKEL KGAA (DE) 1994-07-13 CN disclosed
US-4001159-A Aqueous dispersion of olefin-acrylate copolymer SUMITOMO CHEMICAL COMPANY, LIMITED (JA) 1977-01-04 US disclosed