Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 2/20 | 0.47 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.47 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.47 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.47 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.47 |
| ▸ | GALR3 | O60755 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | BLM | P54132 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | GRN | P28799 | 1/20 | 0.31 |
| ▸ | SORT1 | Q99523 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3256468 | 1.00 | MAPK1 (0.48) | MAPK1TSHRCHRM2CHRM4CHRM1 | |
| SCHEMBL24405017 | 0.83 | TSHR (0.44) | MAPK1TSHRCHRM2CHRM4CHRM1 | |
| SCHEMBL198037 | 0.81 | TSHR (0.45) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL27646130 | 0.81 | MAPK1 (0.46) | MAPK1GRNSORT1 | |
| SCHEMBL19249804 | 0.81 | MAPK1 (0.46) | MAPK1GRNSORT1 | |
| SCHEMBL12429062 | 0.80 | TSHR (0.46) | MAPK1TSHR | |
| SCHEMBL9443190 | 0.79 | MAPK1 (0.45) | MAPK1 | |
| SCHEMBL21757564 | 0.79 | MAPK1 (0.45) | MAPK1 | |
| SCHEMBL17905252 | 0.78 | MAPK1 (0.43) | MAPK1 | |
| SCHEMBL27646288 | 0.78 | TSHR (0.42) | MAPK1TSHRCHRM2CHRM4CHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3432 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116003674-A | Resin and preparation method of ArF wet photoresist containing resin | 上海芯刻微材料技术有限责任公司 | 2023-04-25 | — | — | CN | claimed |
| CN-116003672-A | Resin and ArF wet photoresist containing same | 上海芯刻微材料技术有限责任公司 | 2023-04-25 | — | — | CN | claimed |
| CN-116003673-A | Resin and application of ArF wet photoresist containing resin | 上海芯刻微材料技术有限责任公司 | 2023-04-25 | — | — | CN | claimed |
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | claimed |
| US-9760010-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | claimed |
| US-20170003590-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-05 | — | — | US | claimed |
| US-20160363866-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-15 | — | — | US | claimed |
| US-9069245-B2 | Near-infrared absorptive layer-forming composition and multilayer film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-30 | — | — | US | claimed |
| US-8623590-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-07 | — | — | US | claimed |
| US-20120108043-A1 | PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | claimed |
| US-6730451-B2 | FLUOROACRYLATE POLYMERS; TRANSPARENCY; PREVENTING NEGATIVE WORKING; LOW ABSORPTION OF FLUORINE EXCIMER LASER LIGHT; HIGH TRANSMITTANCE TO VACUUM ULTRAVIOLET RADITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-05-04 | — | — | US | claimed |
| US-20260147275-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-28 | — | — | US | disclosed |
| US-20260147274-A1 | SULFONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-28 | — | — | US | disclosed |
| EP-4749364-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-05-27 | — | — | EP | disclosed |
| EP-4749365-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-05-27 | — | — | EP | disclosed |
| EP-0908783-A1 | Resist compositions, their preparation and use for patterning processes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| EP-0887705-A1 | Resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-12-30 | — | — | EP | disclosed |
| EP-0723007-B1 | Azeotrope and azeotrope-like compositions of octamethyltrisiloxane | DOW CORNING (US) | 1998-10-28 | — | — | EP | disclosed |
| EP-0520103-A1 | Synthesis of hydroxyl-terminated diene oligomers | TEXACO CHEMICAL COMPANY (US) | 1992-12-30 | — | — | EP | disclosed |
| US-5159123-A | Synthesis of hydroxyl-terminated polybutadienes using glycol ether acetate solvents | TEXACO CHEMICAL COMPANY (US) | 1992-10-27 | — | — | US | disclosed |