Bisphenol A

Bisphenol A

SCHEMBL6607352

CC(C)(c1ccc(O)c(F)c1)c1ccc(O)c(F)c1.CC(C)(c1ccc(O)cc1)c1ccc(O)cc1

nearest known ligand 0.61

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 10/20 0.61
ESR2 Q92731 7/20 0.61
HSD17B10 Q99714 3/20 0.61
CYP3A4 P08684 2/20 0.61
HPGD P15428 2/20 0.61
ESRRG P62508 2/20 0.61
AR P10275 1/20 0.61
TSHR P16473 1/20 0.61
SLC6A2 P23975 1/20 0.61
SLC6A4 P31645 1/20 0.61
HTR6 P50406 1/20 0.61
SLC6A3 Q01959 1/20 0.61
ALDH1A1 P00352 3/20 0.53
KLF10 Q13118 1/20 0.47
LMNA P02545 2/20 0.45
TYR P14679 2/20 0.45
ALOX15 P16050 3/20 0.44
ALOX12 P18054 1/20 0.44
RORC P51449 1/20 0.43
TDP1 Q9NUW8 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30625965 1.00 ESR1 (0.61) ESR1ESR2HSD17B10CYP3A4HPGD
SCHEMBL16565722 1.00 ESR1 (0.61) ESR1ESR2HSD17B10CYP3A4HPGD
SCHEMBL15961422 0.95 ESR1 (0.55) ESR1ESR2HSD17B10CYP3A4HPGD
SCHEMBL4462227 0.94 ESR1 (0.59) ESR1ESR2HSD17B10CYP3A4HPGD
SCHEMBL29372911 0.92 ESR1 (0.61) ESR1ESR2HSD17B10CYP3A4HPGD
SCHEMBL544510 0.92 ESR1 (0.61) ESR1ESR2HSD17B10CYP3A4HPGD
Cyanate SCHEMBL30541970 0.92 ESR1 (0.52) ESR1ESR2HSD17B10CYP3A4HPGD
SCHEMBL12299320 0.89 ESR1 (0.49) ESR1ESR2HSD17B10CYP3A4HPGD
SCHEMBL4460477 0.85 ESR1 (0.60) ESR1ESR2HSD17B10CYP3A4HPGD
SCHEMBL17456366 0.85 ESR1 (0.77) ESR1ESR2HSD17B10CYP3A4HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1375463-A1 OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION Kansai Research Institute, Inc. (JP) 2004-01-02 EP disclosed