Cysteine

Cysteine

SCHEMBL663459

NC(CS)C(=O)O.[Co]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cysteine SCHEMBL663461 1.00
Cysteine SCHEMBL95110 0.97
Cysteine SCHEMBL21110883 0.97 PTGS1 (1.00)
Cysteine SCHEMBL7898895 0.97 PTGS1 (1.00)
Cysteine SCHEMBL1868335 0.97 PTGS1 (1.00)
Cysteine SCHEMBL5705426 0.97 PTGS1 (1.00)
Cysteine SCHEMBL5705430 0.97 PTGS1 (1.00)
Cysteine SCHEMBL4289403 0.97
Cysteine SCHEMBL339562 0.97 PTGS1 (1.00)
Cysteine SCHEMBL29387447 0.97

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9513551-B2 Process for producing a photomask on a photopolymeric surface DIGIFLEX LTD. (IL) 2016-12-06 US disclosed
EP-2562599-B1 Process for producing a photomask on a photopolymeric surface DIGIFLEX LTD (IL) 2014-12-10 EP disclosed
EP-2391924-B1 PROCESS FOR PRODUCING A PHOTOMASK ON A PHOTOPOLYMERIC SURFACE DIGIFLEX LTD (IL) 2013-07-24 EP disclosed
EP-2562599-A2 Process for producing a photomask on a photopolymeric surface Digiflex Ltd. (IL) 2013-02-27 EP disclosed
US-20120045583-A1 PROCESS FOR PRODUCING A PHOTOMASK ON A PHOTOPOLYMERIC SURFACE DIGIFLEX LTD. (IL) 2012-02-23 US disclosed