SCHEMBL6635489

SCHEMBL6635489

C=C(C)C(=O)[CH]CN(C)C

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.32
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11113804 0.77 ALDH1A1 (0.33) ALDH1A1
SCHEMBL5679366 0.77 ALDH1A1 (0.33) ALDH1A1
SCHEMBL6751741 0.74
SCHEMBL7607573 0.72
SCHEMBL49112 0.72
SCHEMBL6257797 0.71 EGFR (0.31)
SCHEMBL9155393 0.70
Methacrylic Acid SCHEMBL28117137 0.70 ALDH1A1 (0.35) TDP1ALDH1A1
SCHEMBL4535974 0.68
SCHEMBL7757940 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1104778-B1 Method of production of composited particle for chemical mechanical polishing JSR CORP (JP) 2004-11-03 EP disclosed
US-6582761-B1 Condensation and coupling of organometallic and/or organosilicon compound JSR CORPORATION (JP) 2003-06-24 US disclosed
EP-1243611-A1 Composited particles and aqueous dispersions for chemical mechanical polishing JSR Corporation (JP) 2002-09-25 EP disclosed
EP-1104778-A2 Method of production of composited particle for chemical mechanical polishing JSR Corporation (JP) 2001-06-06 EP disclosed