⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL10481824 | 1.00 | — | — | |
| Fluoride SCHEMBL9403092 | 1.00 | — | — | |
| Fluoride SCHEMBL9403127 | 1.00 | — | — | |
| Fluoride SCHEMBL673013 | 1.00 | — | — | |
| Fluoride SCHEMBL9403147 | 1.00 | — | — | |
| Fluoride SCHEMBL9403105 | 1.00 | — | — | |
| Fluoride SCHEMBL673376 | 1.00 | — | — | |
| Fluoride SCHEMBL8027484 | 1.00 | — | — | |
| Fluoride SCHEMBL673636 | 1.00 | — | — | |
| Fluoride SCHEMBL714103 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1535 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12635434-B2 | High aspect ratio contact etching with additive gas | TOKYO ELECTRON LIMITED (JP) | 2026-05-19 | — | — | US | claimed |
| WO-2026101809-A1 | MOLYBDENUM LINER DEPOSITION | LAM RESEARCH CORPORATION (US) | 2026-05-15 | — | — | WO | claimed |
| US-12624445-B2 | Method for removing molybdenum monofluoride to molybdenum pentafluoride and method for producing semiconductor device | CENTRAL GLASS CO., LTD. (JP) | 2026-05-12 | — | — | US | claimed |
| WO-2026090013-A1 | ETCHING OF MOLYBDENUM | LAM RESEARCH CORPORATION (US) | 2026-04-30 | — | — | WO | claimed |
| US-12571100-B2 | Atomic layer deposition of molybdenum silicide thin films | APPLIED MATERIALS, INC. (US) | 2026-03-10 | — | — | US | claimed |
| CN-121587107-A | Etching method and plasma processing apparatus | 东京毅力科创株式会社 | 2026-02-27 | — | — | CN | claimed |
| US-20260060020-A1 | ETCHING METHOD AND PLASMA PROCESSING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2026-02-26 | — | — | US | claimed |
| WO-2025264711-A1 | MOLYBDENUM DEPOSITION | LAM RESEARCH CORPORATION (US) | 2025-12-26 | — | — | WO | claimed |
| WO-2025245154-A1 | METALLIZATION PRECURSORS AND ONBOARD COMBINATORIAL CHEMICAL SYNTHESIS | LAM RESEARCH CORPORATION (US) | 2025-11-27 | — | — | WO | claimed |
| US-12467133-B2 | Conformal molybdenum deposition | APPLIED MATERIALS, INC. (US) | 2025-11-11 | — | — | US | claimed |
| EP-0024128-B1 | PHOSPHORYLATION PROCESS | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1984-02-01 | — | — | EP | claimed |
| US-4343676-A | Etching a semiconductor material and automatically stopping same | RCA CORPORATION (US) | 1982-08-10 | — | — | US | claimed |
| US-4265982-A | VAPOR DEPOSITION OF METALS IN A FLUIDIZED BED | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF ENERGY (US) | 1981-05-05 | — | — | US | claimed |
| EP-0024128-A2 | Phosphorylation process | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1981-02-25 | — | — | EP | claimed |
| US-4241591-A | Air conditioning system employing dual cycle | THE ROVAC CORPORATION (US) | 1980-12-30 | — | — | US | claimed |
| US-RE30430-E | Catalyst treatment | DENKA CHEMICAL CORPORATION (US) | 1980-11-04 | — | — | US | claimed |
| US-4172159-A | INPINGEMENT OF ORGANOTIN COMPOUND | SAINT-GOBAIN INDUSTRIES (FR) | 1979-10-23 | — | — | US | claimed |
| US-4130594-A | Liquid phase fluorination process | HOOKER CHEMICALS & PLASTICS CORP. (US) | 1978-12-19 | — | — | US | claimed |
| US-4006168-A | Catalyst treatment | PETRO-TEX CHEMICAL CORPORATION (US) | 1977-02-01 | — | — | US | claimed |
| US-3959234-A | CATALYSTS OF ORGANOALUMINUM COMPOUNDS AND A TUNGSTEN OR MOLYBDENUM COMPOUND, RING-OPENING | SHOWA DENKO KABUSHIKI KAISHA (JA) | 1976-05-25 | — | — | US | claimed |