⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL10481824 | 1.00 | — | — | |
| Fluoride SCHEMBL665679 | 1.00 | — | — | |
| Fluoride SCHEMBL9403092 | 1.00 | — | — | |
| Fluoride SCHEMBL9403127 | 1.00 | — | — | |
| Fluoride SCHEMBL673013 | 1.00 | — | — | |
| Fluoride SCHEMBL9403147 | 1.00 | — | — | |
| Fluoride SCHEMBL9403105 | 1.00 | — | — | |
| Fluoride SCHEMBL8027484 | 1.00 | — | — | |
| Fluoride SCHEMBL673636 | 1.00 | — | — | |
| Fluoride SCHEMBL714103 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 352 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026101630-A1 | METHODS OF SELECTIVELY ETCHING SILICON | APPLIED MATERIALS, INC. (US) | 2026-05-15 | — | — | WO | claimed |
| US-20260130144-A1 | METHODS OF SELECTIVELY ETCHING SILICON | APPLIED MATERIALS, INC. (US) | 2026-05-07 | — | — | US | claimed |
| US-12571100-B2 | Atomic layer deposition of molybdenum silicide thin films | APPLIED MATERIALS, INC. (US) | 2026-03-10 | — | — | US | claimed |
| US-20250340986-A1 | ATOMIC LAYER DEPOSITION OF MOLYBDENUM SILICIDE THIN FILMS | APPLIED MATERIALS, INC. (US) | 2025-11-06 | — | — | US | claimed |
| WO-2025230819-A1 | ATOMIC LAYER DEPOSITION OF MOLYBDENUM SILICIDE THIN FILMS | APPLIED MATERIALS, INC. (US) | 2025-11-06 | — | — | WO | claimed |
| WO-2025226982-A1 | DUAL SILICIDE CONTACTS ENABLED WITH ION IMPLANTATION | ENTEGRIS, INC. (US) | 2025-10-30 | — | — | WO | claimed |
| US-20250338559-A1 | DUAL SILICIDE CONTACTS ENABLED WITH ION IMPLANTATION | ENTEGRIS INC (US) | 2025-10-30 | — | — | US | claimed |
| CN-117720830-B | Modified conductive carbon black, carbon-coated slurry, carbon-coated aluminum foil and preparation methods thereof | 东莞东阳光科研发有限公司 | 2025-02-25 | — | — | CN | claimed |
| CN-114122566-B | Electrochemical device and electric equipment comprising same | 东莞新能源科技有限公司 | 2024-10-18 | — | — | CN | claimed |
| CN-118675982-A | Deposition of metal borides and metal silicides | ASM IP控股有限公司 | 2024-09-20 | — | — | CN | claimed |
| CN-114122566-A | Electrochemical device and electric equipment comprising same | 东莞新能源科技有限公司 | 2022-03-01 | — | — | CN | claimed |
| CN-113789512-A | Preparation method of composite coating material | 厦门中材航特科技有限公司 | 2021-12-14 | — | — | CN | claimed |
| CN-113463063-A | Preparation method of refractory metal material | 厦门中材航特科技有限公司 | 2021-10-01 | — | — | CN | claimed |
| CN-111785407-A | Treatment method of molybdenum-containing substance | 中国科学院上海应用物理研究所 | 2020-10-16 | — | — | CN | claimed |
| CN-107126948-B | Molybdenum-based catalyst | 北京宇极科技发展有限公司 | 2020-07-10 | — | — | CN | claimed |
| US-20170306479-A1 | DEPOSITION OF METAL BORIDES AND SILICIDES | ASM IP HOLDING B.V. (NL) | 2017-10-26 | — | — | US | claimed |
| US-8354469-B2 | Perfluoropolymer composition | SOLVAY SOLEXIS, INC. (US) | 2013-01-15 | — | — | US | claimed |
| US-20090069480-A1 | Perfluoropolymer Composition | SOLVAY SOLEXIS, INC. (US) | 2009-03-12 | — | — | US | claimed |
| WO-2007060201-A1 | PERFLUOROPOLYMER COMPOSITION | SOLVAY SOLEXIS, INC. (US) | 2007-05-31 | — | — | WO | claimed |
| US-3959234-A | CATALYSTS OF ORGANOALUMINUM COMPOUNDS AND A TUNGSTEN OR MOLYBDENUM COMPOUND, RING-OPENING | SHOWA DENKO KABUSHIKI KAISHA (JA) | 1976-05-25 | — | — | US | claimed |