SCHEMBL6659339

SCHEMBL6659339

c1ccc(CN2CCN(CCN3CCN(Cc4ccccc4)CCN(Cc4ccccc4)CC3)CCN(Cc3ccccc3)CC2)cc1

nearest known ligand 0.86

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 7/20 0.86
MC4R P32245 1/20 0.76
CCR3 P51677 1/20 0.71
DRD4 P21917 1/20 0.67
LMNA P02545 1/20 0.67
POLB P06746 1/20 0.67
KMT2A Q03164 1/20 0.60

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3061933 0.94 SIGMAR1 (0.75) SIGMAR1MC4RCCR3DRD4LMNA
SCHEMBL242970 0.93 SIGMAR1 (1.00) SIGMAR1MC4RCCR3DRD4LMNA
SCHEMBL1041303 0.93 SIGMAR1 (1.00) SIGMAR1MC4RCCR3DRD4LMNA
SCHEMBL8188324 0.93 SIGMAR1 (1.00) SIGMAR1MC4RCCR3DRD4LMNA
SCHEMBL1415730 0.93 SIGMAR1 (1.00) SIGMAR1MC4RCCR3DRD4LMNA
SCHEMBL576868 0.93 SIGMAR1 (1.00) SIGMAR1MC4RCCR3DRD4LMNA
SCHEMBL2489199 0.93 SIGMAR1 (1.00) SIGMAR1MC4RCCR3DRD4LMNA
SCHEMBL6659913 0.91 CCR3 (0.79) SIGMAR1MC4RCCR3DRD4LMNA
SCHEMBL6657455 0.91 CCR3 (0.85) SIGMAR1MC4RCCR3DRD4LMNA
Water SCHEMBL8695926 0.90 SIGMAR1 (0.95) SIGMAR1MC4RCCR3DRD4LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1160267-B1 CATALYST FOR OXIDATIVE POLYMERIZATION OF FLUOROPHENOL, METHOD OF OXIDATIVE POLYMERIZATION OF FLUOROPHENOL, AND POLY(OXYFLUOROPHENYLENE) DERIVATIVE JAPAN SCIENCE & TECH CORP (JP) 2004-08-04 EP disclosed
US-6689919-B1 SOLUBLE POLY(OXYFLUOROPHENYLENE) COMPOUNDS WITH EXCELLENT HEAT RESISTANCE, MEMBRANE-FORMABILITY AND CHEMICAL STABILITY JAPAN SCIENCE AND TECHNOLOGY CORPORATION (JP) 2004-02-10 US disclosed