Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.70 |
| ▸ | TSHR | P16473 | 4/20 | 0.70 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.70 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.70 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.57 |
| ▸ | LMNA | P02545 | 2/20 | 0.57 |
| ▸ | F2 | P00734 | 1/20 | 0.57 |
| ▸ | MAPT | P10636 | 2/20 | 0.49 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.49 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.48 |
| ▸ | CES1 | P23141 | 1/20 | 0.44 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.43 |
| ▸ | TNF | P01375 | 1/20 | 0.43 |
| ▸ | KLF5 | Q13887 | 1/20 | 0.43 |
| ▸ | NOD1 | Q9Y239 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9745149 | 0.96 | TDP1 (0.70) | TDP1TSHRALDH1A1HSD17B10MAPK1 | |
| Butane SCHEMBL28039493 | 0.93 | TDP1 (0.62) | TDP1TSHRALDH1A1HSD17B10MAPK1 | |
| Benzoyl Peroxide SCHEMBL9251240 | 0.93 | TDP1 (0.65) | TDP1TSHRALDH1A1HSD17B10MAPK1 | |
| SCHEMBL9745567 | 0.91 | TDP1 (0.64) | TDP1TSHRALDH1A1HSD17B10MAPK1 | |
| SCHEMBL11615341 | 0.91 | TDP1 (0.80) | TDP1TSHRALDH1A1HSD17B10MAPK1 | |
| Benzoyl Peroxide SCHEMBL28049936 | 0.91 | TDP1 (0.62) | TDP1TSHRALDH1A1HSD17B10MAPK1 | |
| SCHEMBL11375636 | 0.90 | ALDH1A1 (0.62) | TDP1TSHRALDH1A1HSD17B10MAPK1 | |
| SCHEMBL7914561 | 0.88 | TDP1 (0.59) | TDP1TSHRALDH1A1HSD17B10MAPK1 | |
| Benzoyl Peroxide SCHEMBL1841580 | 0.88 | TDP1 (0.69) | TDP1TSHRALDH1A1HSD17B10MAPK1 | |
| Benzoyl Peroxide SCHEMBL28074296 | 0.85 | TDP1 (0.65) | TDP1TSHRALDH1A1HSD17B10MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12297118-B2 | Process for producing salt from waste aqueous streams of organic peroxides production | NOURYON CHEMICALS INTERNATIONAL B.V. (NL) | 2025-05-13 | — | — | US | disclosed |
| CN-115698097-A | Biodegradable graft polymers | 宝洁公司 | 2023-02-03 | — | — | CN | disclosed |
| CN-115103862-A | Biodegradable graft polymers | 巴斯夫欧洲公司 | 2022-09-23 | — | — | CN | disclosed |
| US-20220081307-A1 | PROCESS FOR PRODUCING SALT FROM WASTE AQUEOUS STREAMS OF ORGANIC PEROXIDES PRODUCTION | NOURYON CHEMICALS INTERNATIONAL B.V. (NL) | 2022-03-17 | — | — | US | disclosed |
| EP-0814109-B1 | Photosensitive polyimide precursor and its use for pattern formation | HITACHI CHEMICAL CO LTD (JP) | 2004-08-18 | — | — | EP | disclosed |
| US-20020048726-A1 | Photosensitive polyimide precursor and its use for pattern formation | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2002-04-25 | — | — | US | disclosed |
| US-6319656-B1 | FORMING FILM OF A NEGATIVE-WORKING PHOTO-SENSITIVE POLYIMIDE PRECURSOR ON A SUBSTRATE; EXPOSING FILM TO LIGHT THROUGH A MASK HAVING A PREDETERMINED PATTERN; DEVELOPING THE EXPOSED FILM USING AN ALKALINE AQUEOUS SOLUTION | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2001-11-20 | — | — | US | disclosed |
| US-6200831-B1 | HEAT-CURING A COATING OF A POLYAMIC ACID BASED ON A TETRACARBOXYLIC ACID AND A DIAMINE CONTAINNG AN ACTIVE OXYGEN OR NITROGEN FUNCTIONAL GROUP; SEALING THE EXTERNAL TERMINALS WITH A RESIN, E.G. AN EPOXIDE | HITACHI, LTD. (JP) | 2001-03-13 | — | — | US | disclosed |
| US-6087006-A | SEMICONDUCTOR DEVICE HAVING SURFACE-PROTECTING FILM COMPRISING POLYIMIDE OBTAINED BY HEAT-CURING PRECURSOR HAVING POLAR SUBSTITUENTS AS THE SIDE CHAINS | HITACHI, LTD. (JP) | 2000-07-11 | — | — | US | disclosed |
| US-6025113-A | FOR PREPARING HIGHLY SENSITIVE NEGATIVE-WORKING PHOTOSENSITIVE MATERIAL DEVELOPABLE WITH ALKALINE AQUEOUS SOLUTION IN SHORT TIME WITH HIGH RESOLUTION | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2000-02-15 | — | — | US | disclosed |
| EP-0814109-A1 | Photosensitive polyimide precursor and its use for pattern formation | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1997-12-29 | — | — | EP | disclosed |