SCHEMBL666091

SCHEMBL666091

COC(=O)c1cc(C(=O)OC)cc(P(=O)(O)O)c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 3/20 0.52
CA1 P00915 3/20 0.52
CA2 P00918 3/20 0.52
CA7 P43166 3/20 0.52
CA9 Q16790 3/20 0.52
CA14 Q9ULX7 3/20 0.52
KDM4E B2RXH2 6/20 0.50
LMNA P02545 3/20 0.50
XDH P47989 2/20 0.50
POLB P06746 2/20 0.50
TDP1 Q9NUW8 2/20 0.50
L3MBTL1 Q9Y468 2/20 0.50
GAA P10253 1/20 0.50
NFKB1 P19838 1/20 0.50
GFER P55789 1/20 0.50
NFKB2 Q00653 1/20 0.50
RELA Q04206 1/20 0.50
FUT7 Q11130 1/20 0.50
ALDH1A1 P00352 3/20 0.47
MAPT P10636 3/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Potassium SCHEMBL29912694 0.98 CA12 (0.50) CA12CA1CA2CA7CA9
SCHEMBL29912668 0.98 CA12 (0.50) CA12CA1CA2CA7CA9
SCHEMBL29912822 0.83 KDM4E (0.39) CA12CA1CA2CA7CA9
SCHEMBL147169 0.82 CA1 (0.71) CA12CA1CA2CA7CA9
SCHEMBL7591454 0.82 CA12 (0.50) CA12CA1CA2CA7CA9
SCHEMBL9339018 0.80 CA12 (0.48) CA12CA1CA2CA7CA9
Potassium Ion SCHEMBL29912532 0.80 CA12 (0.48) CA12CA1CA2CA7CA9
SCHEMBL28864268 0.79 CA1 (0.57) CA12CA1CA2CA7CA9
SCHEMBL665193 0.79 CA12 (0.56) CA12CA1CA2CA7CA9
SCHEMBL28351276 0.78 KDM4E (0.43) CA12CA1CA2CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115197270-B Self-catalytic functional reaction monomer, self-catalytic polymerization and self-catalytic depolymerization functional copolymer, and preparation method and application thereof 四川大学 2024-11-08 CN disclosed
US-20230235116-A1 HIGH-TEMPERATURE SELF-CROSSLINKING-BASED FLAME-RETARDANT ANTI-DRIPPING COPOLYESTER, AND PREPARATION METHOD THEREFOR AND APPLICATION THEREOF SICHUAN UNIVERSITY (CN) 2023-07-27 US disclosed
EP-4169967-A1 HIGH-TEMPERATURE SELF-CROSSLINKING-BASED FLAME-RETARDANT DROPLET-RESISTANT COPOLYESTER, AND PREPARATION METHOD THEREFOR AND APPLICATION THEREOF Sichuan University (CN) 2023-04-26 EP disclosed
US-11529760-B2 Polymeric materials and articles manufactured there from THE PROCTER & GAMBLE COMPANY (US) 2022-12-20 US disclosed
CN-115197270-A Self-catalytic functional reaction monomer, self-catalytic polymerization and self-catalytic depolymerization functional copolymer, and preparation method and application thereof 四川大学 2022-10-18 CN disclosed
US-11040812-B2 Water soluble containers and methods of making them THE PROCTER & GAMBLE COMPANY (US) 2021-06-22 US disclosed
US-20200270038-A1 WATER SOLUBLE CONTAINERS AND METHODS OF MAKING THEM PROCTER & GAMBLE (US) 2020-08-27 US disclosed
US-10703549-B2 Water soluble containers and methods of making them THE PROCTER AND GAMBLE COMPANY (US) 2020-07-07 US disclosed
EP-3645697-A1 WATER SOLUBLE CONTAINERS AND METHODS OF MAKING THEM The Procter and Gamble Company (US) 2020-05-06 EP disclosed
US-20200086551-A1 Polymeric Materials and Articles Manufactured There From PROCTER & GAMBLE (US) 2020-03-19 US disclosed
EP-2431374-A1 METHOD FOR PRODUCING PHOSPHONIC ACID METAL SALT FINE PARTICLES Nissan Chemical Industries, Ltd. (JP) 2012-03-21 EP disclosed
US-20120046397-A1 METHOD FOR PRODUCING PHOSPHONIC ACID METAL SALT FINE PARTICLES NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-02-23 US disclosed
US-20110196077-A1 PRODUCTION PROCESS OF PHOSPHONIC ACID METAL SALT AND THERMOPLASTIC RESIN COMPOSITION CONTAINING PHOSPHONIC ACID METAL SALT NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2011-08-11 US disclosed
US-7531585-B2 Polyactic acid resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-05-12 US disclosed
CN-100384937-C Polylactic acid resin composition NISSAN CHEMICAL IND LTD (JP) 2008-04-30 CN disclosed
US-20070299170-A1 Containing zinc phenyl phosphonate as crystal nucleator appropriate for accelerating crystallization; heat resistance and forming processability NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-12-27 US disclosed
CN-1938378-A Polylactic acid resin composition NISSAN CHEMICAL IND LTD (JP) 2007-03-28 CN disclosed
EP-1736510-A1 POLYLACTIC ACID RESIN COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2006-12-27 EP disclosed
JP-2000095788-A PRODUCTION OF PHENYLPHOSPHONIC ACID NISSAN CHEM IND LTD 2000-04-04 JP disclosed
US-5215874-A Silver halide photographic material having magnetic recording member FUJI PHOTO FILM CO., LTD. (JP) 1993-06-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110196077-A1 PRODUCTION PROCESS OF PHOSPHONIC ACID METAL SALT AND THERMOPLASTIC RESIN COMPOSITION CONTAINING PHOSPHONIC ACID METAL SALT PPA1, PHOSPHO1, PRPS1 CA12 1812/4885CA1 475/4885CA2 577/4885
US-11529760-B2 Polymeric materials and articles manufactured there from ALG3, CD68, VCL CA12 1322/4885CA1 922/4885CA2 1773/4885
US-20200086551-A1 Polymeric Materials and Articles Manufactured There From ALG3, CD68, VCL CA12 1322/4885CA1 922/4885CA2 1773/4885
US-20120046397-A1 METHOD FOR PRODUCING PHOSPHONIC ACID METAL SALT FINE PARTICLES PHOSPHO1, PLA2G2C, ACP1 CA12 47/4885CA1 13/4885CA2 9/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.