SCHEMBL6668938

SCHEMBL6668938

CC(C(=O)O)C(C)(N)N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17047147 0.82
SCHEMBL9440534 0.82
SCHEMBL28952597 0.80
Hydrochloric Acid SCHEMBL7356462 0.80 ALDH1A1 (0.39)
SCHEMBL11305045 0.78 ALDH1A1 (0.37)
SCHEMBL2686145 0.78 TP53 (0.47)
Hydrochloric Acid SCHEMBL16238386 0.76 ALDH1A1 (0.36)
SCHEMBL125061 0.75
SCHEMBL10804484 0.75 TP53 (0.44)
SCHEMBL5541229 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0976010-B1 WATERBORNE PHOTORESISTS MADE FROM URETHANE ACRYLATES ADVANCED COATINGS INTERNAT LTD (IL) 2004-09-22 EP claimed
US-6207346-B1 HAVING SUFFICIENT CARBOXYLIC ACID FUNCTIONALITY TO RENDER IT DEVELOP ABLE IN ALKALINE AQUEOUS SOLUTION AND A PHOTOINITIATOR CHEMICAL SYSTEM ADVANCED COATINGS INTERNATIONAL (IL) 2001-03-27 US claimed
EP-0976010-A4 WATERBORNE PHOTORESISTS MADE FROM URETHANE ACRYLATES ADVANCED COATINGS INTERNAT LTD (IL) 2001-03-21 EP claimed
EP-0976010-A1 WATERBORNE PHOTORESISTS MADE FROM URETHANE ACRYLATES Advanced Coatings International Ltd. (IL) 2000-02-02 EP claimed
WO-1998045755-A1 WATERBORNE PHOTORESISTS MADE FROM URETHANE ACRYLATES ADVANCED COATINGS INTERNATIONAL LTD. (IL) 1998-10-15 WO claimed