Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TGFBR1 | P36897 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.30 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | RELA | Q04206 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11603789 | 0.80 | TGFBR1 (0.46) | TGFBR1ALDH1A1 | |
| SCHEMBL7757007 | 0.80 | TGFBR1 (0.44) | TGFBR1RXFP1ALDH1A1 | |
| SCHEMBL25292405 | 0.77 | HPGD (0.47) | HPGDALDH1A1MEN1MAPTNFKB1 | |
| SCHEMBL24333197 | 0.74 | TGFBR1 (0.50) | TGFBR1RXFP1ALDH1A1 | |
| SCHEMBL1820299 | 0.74 | TGFBR1 (0.50) | TGFBR1RXFP1ALDH1A1 | |
| SCHEMBL11342032 | 0.73 | TGFBR1 (0.45) | TGFBR1RXFP1ALDH1A1 | |
| SCHEMBL8973983 | 0.73 | TGFBR1 (0.45) | TGFBR1RXFP1ALDH1A1 | |
| SCHEMBL50197 | 0.72 | — | — | |
| Ammonia Solution, Strong SCHEMBL717284 | 0.71 | TGFBR1 (0.40) | TGFBR1RXFP1 | |
| Dicloralurea SCHEMBL134347 | 0.71 | HPGD (0.45) | HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2960314-B1 | POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE | FUJIMI INC (JP) | 2024-06-26 | — | — | EP | disclosed |
| US-11897081-B2 | Method for polishing silicon substrate and polishing composition set | FUJIMI INCORPORATED (JP) | 2024-02-13 | — | — | US | disclosed |
| EP-3159915-B1 | METHOD FOR POLISHING SILICON WAFER, POLISHING COMPOSITION, AND POLISHING COMPOSITION SET | FUJIMI INC (JP) | 2023-12-06 | — | — | EP | disclosed |
| EP-3133638-B1 | COMPOSITION FOR POLISHING SILICON WAFERS | FUJIMI INC (JP) | 2021-10-27 | — | — | EP | disclosed |
| CN-106463386-B | Method for polishing silicon wafer, polishing composition, and polishing composition set | 福吉米株式会社 | 2020-12-01 | — | — | CN | disclosed |
| EP-2957613-B1 | POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INC (JP) | 2020-11-18 | — | — | EP | disclosed |
| US-10745588-B2 | Silicon wafer polishing composition | FUJIMI INCORPORATED (JP) | 2020-08-18 | — | — | US | disclosed |
| CN-111040731-A | Composition for polishing silicon wafer | 福吉米株式会社 | 2020-04-21 | — | — | CN | disclosed |
| EP-3007213-B1 | USE OF A COMPOSITION FOR SILICON WAFER POLISHING | FUJIMI INC (JP) | 2020-03-18 | — | — | EP | disclosed |
| EP-3133639-B1 | COMPOSITION FOR POLISHING SILICON WAFERS | FUJIMI INC (JP) | 2019-06-26 | — | — | EP | disclosed |
| US-20150376464-A1 | POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INCORPORATED (JP) | 2015-12-31 | — | — | US | disclosed |
| EP-2960314-A1 | POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE | Fujimi Incorporated (JP) | 2015-12-30 | — | — | EP | disclosed |
| EP-2957613-A1 | POLISHING COMPOSITION, PRODUCTION METHOD FOR POLISHING COMPOSITION, AND PRODUCTION METHOD FOR POLISHED ARTICLE | Fujimi Incorporated (JP) | 2015-12-23 | — | — | EP | disclosed |
| WO-2004020446-A2 | N-(2, 2, 2-TRICHLORO-1-DIALKYLPHOSPHONATOETHYL) (METH)ACRYLAMIDE, PRODUCTION THEREOF, USE THEREOF AS A COMONOMER FOR THE PRODUCTION OF METHACRYL FOAMS, AND SELF-EXTINGUISHING METHACRYL FOAMS PRODUCED THEREWITH | Röhm GmbH & Co. KG (DE) | 2004-03-11 | — | — | WO | disclosed |
| EP-1245652-A1 | Aqueous ink for inkjet printing | Kao Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| US-5852074-A | Aqueous ink for inkjet printing | KAO CORPORATION (JP) | 1998-12-22 | — | — | US | disclosed |
| EP-0791610-A2 | Aqueus ink for inkjet printing | KAO CORPORATION (JP) | 1997-08-27 | — | — | EP | disclosed |
| EP-0410276-B1 | Graft polymer with unsaturated side groups, light-sensitive mixture containing same and recording material made from same | HOECHST AG (DE) | 1994-05-11 | — | — | EP | disclosed |
| US-5134053-A | GRAFT POLYMER WITH UNSATURATED LATERAL CHAINS, PHOTOSENSITIVE MIXTURE CONTAINING SAID GRAFT POLYMER AND RECORDING MATERIAL PRODUCED THEREFROM | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-07-28 | — | — | US | disclosed |
| US-5128386-A | Hot melt adhesives | BASF AKTIENGESELLSCHAFT (DE) | 1992-07-07 | — | — | US | disclosed |