Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.76 |
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.76 |
| ▸ | MEN1 | O00255 | 5/20 | 0.76 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.76 |
| ▸ | POLB | P06746 | 2/20 | 0.76 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.76 |
| ▸ | HPGD | P15428 | 3/20 | 0.69 |
| ▸ | GAA | P10253 | 2/20 | 0.67 |
| ▸ | XBP1 | P17861 | 1/20 | 0.67 |
| ▸ | ELANE | P08246 | 1/20 | 0.62 |
| ▸ | MAPK10 | P53779 | 1/20 | 0.60 |
| ▸ | NPC1 | O15118 | 4/20 | 0.59 |
| ▸ | RAB9A | P51151 | 4/20 | 0.59 |
| ▸ | RXFP1 | Q9HBX9 | 2/20 | 0.59 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.57 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.57 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.57 |
| ▸ | TP53 | P04637 | 2/20 | 0.57 |
| ▸ | MAPT | P10636 | 2/20 | 0.57 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.57 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8016999 | 0.97 | ALDH1A1 (0.73) | ALDH1A1KDM4EMEN1KMT2APOLB | |
| SCHEMBL692806 | 0.95 | ALDH1A1 (0.76) | ALDH1A1KDM4EMEN1KMT2APOLB | |
| SCHEMBL29444198 | 0.95 | ALDH1A1 (0.76) | ALDH1A1KDM4EMEN1KMT2APOLB | |
| SCHEMBL27829159 | 0.86 | ALDH1A1 (0.82) | ALDH1A1KDM4EMEN1KMT2APOLB | |
| SCHEMBL12959615 | 0.84 | ELANE (0.73) | ALDH1A1KDM4EMEN1KMT2APOLB | |
| SCHEMBL29444205 | 0.82 | ELANE (0.71) | ALDH1A1KDM4EMEN1KMT2APOLB | |
| SCHEMBL692194 | 0.82 | ELANE (0.71) | ALDH1A1KDM4EMEN1KMT2APOLB | |
| SCHEMBL29456973 | 0.82 | ELANE (0.93) | ALDH1A1KDM4EMEN1KMT2ASMN1; SMN2 | |
| SCHEMBL125184 | 0.82 | ELANE (0.93) | ALDH1A1KDM4EMEN1KMT2ASMN1; SMN2 | |
| SCHEMBL23668747 | 0.81 | ELANE (0.69) | ALDH1A1KDM4EMEN1KMT2APOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120092045-A | Synergistic stabilizer composition and method for protecting organic material from UV rays and thermal degradation using the same | 塞特工业公司 | 2025-06-03 | — | — | CN | claimed |
| CN-117597403-A | Composition and method for protecting a coating from harmful effects of exposure to UV-C light | 塞特工业公司 | 2024-02-23 | — | — | CN | claimed |
| CN-116783246-A | Compositions and methods for protecting organic polymeric materials from discoloration due to exposure to UV-C light | 塞特工业公司 | 2023-09-19 | — | — | CN | claimed |
| CN-116745353-A | Compositions and methods for protecting organic polymeric materials from the deleterious effects of UV-C light exposure | 塞特工业公司 | 2023-09-12 | — | — | CN | claimed |
| CN-115368629-A | Stabilizer composition and method for protecting organic materials from UV light and thermal degradation using the same | 塞特工业公司 | 2022-11-22 | — | — | CN | claimed |
| CN-112055728-A | Particulate stabilizer composition for polymer resins and process for producing the same | 塞特工业公司 | 2020-12-08 | — | — | CN | claimed |
| CN-120092045-A | Synergistic stabilizer composition and method for protecting organic material from UV rays and thermal degradation using the same | 塞特工业公司 | 2025-06-03 | — | — | CN | disclosed |
| CN-118591450-A | Polymer composition with densification promoter and rotational molding method for manufacturing hollow article therefrom | 塞特工业公司 | 2024-09-03 | — | — | CN | disclosed |
| CN-117597403-A | Composition and method for protecting a coating from harmful effects of exposure to UV-C light | 塞特工业公司 | 2024-02-23 | — | — | CN | disclosed |
| CN-116783246-A | Compositions and methods for protecting organic polymeric materials from discoloration due to exposure to UV-C light | 塞特工业公司 | 2023-09-19 | — | — | CN | disclosed |
| CN-116745353-A | Compositions and methods for protecting organic polymeric materials from the deleterious effects of UV-C light exposure | 塞特工业公司 | 2023-09-12 | — | — | CN | disclosed |
| CN-112055728-B | Granular stabilizer composition for polymer resin and method for producing the same | 塞特工业公司 | 2023-05-05 | — | — | CN | disclosed |
| CN-115368629-A | Stabilizer composition and method for protecting organic materials from UV light and thermal degradation using the same | 塞特工业公司 | 2022-11-22 | — | — | CN | disclosed |
| CN-112055728-A | Particulate stabilizer composition for polymer resins and process for producing the same | 塞特工业公司 | 2020-12-08 | — | — | CN | disclosed |
| CN-111116982-A | Stabilizer composition and method for protecting organic materials from UV light and thermal degradation using the same | 塞特工业公司 | 2020-05-08 | — | — | CN | disclosed |
| EP-1438352-A1 | LOW COLOR, LOW SODIUM BENZOXAZINONE UV ABSORBERS AND PROCESS FOR MAKING SAME | Cytec Technology Corp. (US) | 2004-07-21 | — | — | EP | disclosed |
| WO-2003035735-A1 | LOW COLOR, LOW SODIUM BENZOXAZINONE UV ABSORBERS AND PROCESS FOR MAKING SAME | CYTEC TECHNOLOGY CORP. (US) | 2003-05-01 | — | — | WO | disclosed |