⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23169807 | 0.83 | — | — | |
| SCHEMBL23170153 | 0.83 | — | — | |
| SCHEMBL14558780 | 0.81 | CES2 (0.33) | — | |
| SCHEMBL25161036 | 0.79 | — | — | |
| SCHEMBL13078616 | 0.79 | — | — | |
| SCHEMBL27802847 | 0.79 | TSHR (0.31) | — | |
| SCHEMBL23176680 | 0.76 | — | — | |
| SCHEMBL6408536 | 0.73 | — | — | |
| SCHEMBL798977 | 0.73 | — | — | |
| SCHEMBL25119316 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10443093-B2 | Fluorous oligonucleotide microarray | MS² ARRAY LLC (US) | 2019-10-15 | — | — | US | disclosed |
| US-20170073743-A1 | FLUOROUS OLIGONUCLEOTIDE MICROARRAY | MS² ARRAY LLC | 2017-03-16 | — | — | US | disclosed |
| US-8829087-B2 | Transparent layer forming polymer | PROMERUS, LLC (US) | 2014-09-09 | — | — | US | disclosed |
| US-20120149815-A1 | Transparent Layer Forming Polymer | PROMERUS LLC (US) | 2012-06-14 | — | — | US | disclosed |
| US-7537880-B2 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-05-26 | — | — | US | disclosed |
| US-20080118860-A1 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-05-22 | — | — | US | disclosed |
| EP-1193309-B1 | Solvent blend for use in high purity precursor removal | AIR PROD & CHEM (US) | 2004-11-03 | — | — | EP | disclosed |
| EP-1193309-A1 | Solvent blend for use in high purity precursor removal | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2002-04-03 | — | — | EP | disclosed |