SCHEMBL6691376

SCHEMBL6691376

C=C(C)c1ccc(OC(CCCC)OCCCCCC)cc1

nearest known ligand 0.42

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TP53 P04637 2/20 0.42
TSHR P16473 1/20 0.42
PLA2G4B P0C869 4/20 0.41
RARB P10826 3/20 0.40
NPC1 O15118 1/20 0.40
LMNA P02545 1/20 0.40
GAA P10253 1/20 0.40
MAPT P10636 1/20 0.40
ALOX15 P16050 1/20 0.40
RAB9A P51151 1/20 0.40
HSD17B10 Q99714 1/20 0.40
NR5A1 Q13285 1/20 0.40
STS P08842 5/20 0.39
CNR2 P34972 2/20 0.38
PLA2G4A P47712 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6699131 0.99 TP53 (0.40) TP53TSHRPLA2G4BRARBNPC1
SCHEMBL6693603 0.96 GAA (0.36) TP53TSHRPLA2G4BNPC1LMNA
SCHEMBL6689548 0.94 TP53 (0.42) TP53TSHRPLA2G4BRARBNPC1
SCHEMBL6692323 0.93 GAA (0.34) TP53TSHRPLA2G4BGAARAB9A
SCHEMBL6693755 0.93 TP53 (0.40) TP53TSHRPLA2G4BRARBNPC1
SCHEMBL6699140 0.90 TP53 (0.43) TP53TSHRPLA2G4BRARBNPC1
SCHEMBL6693689 0.90 GAA (0.36) TP53TSHRPLA2G4BRARBNPC1
SCHEMBL6698189 0.89 TP53 (0.41) TP53TSHRPLA2G4BRARBNPC1
SCHEMBL6689384 0.89 TAS1R3 (0.32) TP53TSHRPLA2G4BGAARAB9A
SCHEMBL6694149 0.85 TSHR (0.36) TP53TSHRPLA2G4BRARBNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed