SCHEMBL6693055

SCHEMBL6693055

CCCCOOc1ccccc1C(=O)O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.59
KMT2A Q03164 3/20 0.59
MEN1 O00255 2/20 0.59
RECQL P46063 1/20 0.59
TSHR P16473 6/20 0.51
TDP1 Q9NUW8 3/20 0.51
L3MBTL1 Q9Y468 2/20 0.51
ALDH1A1 P00352 7/20 0.50
HTT P42858 2/20 0.50
PTK2B Q14289 1/20 0.50
PTPN11 Q06124 2/20 0.49
HSD17B10 Q99714 3/20 0.49
HPGD P15428 2/20 0.49
ESR1 P03372 1/20 0.49
ITGB3 P05106 1/20 0.49
ITGA2B P08514 1/20 0.49
HMGB1 P09429 1/20 0.49
GGT1 P19440 1/20 0.49
PTGS1 P23219 1/20 0.49
PTGS2 P35354 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8369187 0.95 KMT2A (0.57) KDM4EKMT2AMEN1RECQLTSHR
SCHEMBL10697083 0.94 PTPN11 (0.56) KDM4EKMT2AMEN1RECQLTSHR
SCHEMBL10696272 0.94 PTPN11 (0.56) KDM4EKMT2AMEN1RECQLTSHR
SCHEMBL10695467 0.94 PTPN11 (0.56) KDM4EKMT2AMEN1RECQLTSHR
SCHEMBL6256221 0.94 PTPN11 (0.56) KDM4EKMT2AMEN1RECQLTSHR
SCHEMBL9845254 0.94 PTPN11 (0.56) KDM4EKMT2AMEN1RECQLTSHR
SCHEMBL458733 0.94 PTPN11 (0.56) KDM4EKMT2AMEN1RECQLTSHR
SCHEMBL9845259 0.94 PTPN11 (0.56) KDM4EKMT2AMEN1RECQLTSHR
SCHEMBL10697930 0.94 PTPN11 (0.56) KDM4EKMT2AMEN1RECQLTSHR
Vinyl Chloride SCHEMBL28276528 0.87 KMT2A (0.50) KDM4EKMT2AMEN1RECQLTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4630521-A1 SULFUR-FREE DISPERSANT POLYMERS FOR INDUSTRIAL APPLICATIONS Evonik Operations GmbH (DE) 2025-10-15 EP disclosed
WO-2024120926-A1 SULFUR-FREE DISPERSANT POLYMERS FOR INDUSTRIAL APPLICATIONS EVONIK OPERATIONS GMBH (DE) 2024-06-13 WO disclosed
WO-2021140248-A1 INKJET METHOD FOR PRODUCING A SPECTACLE LENS CARL ZEISS VISION INTERNATIONAL GMBH (DE) 2021-07-15 WO disclosed
WO-2004085572-A1 SEALING PROFILE AND METHOD FOR THE PRODUCTION THEREOF GLUSKE GMBH (DE) 2004-10-07 WO disclosed
US-6130285-A FOR PROTECTING METALLIC AND MINERAL SUBSTRATES AGAINST CORROSION, EROSION AND ECHANICAL DAMAGE BAYER AKTIENGESELLSCHAFT (DE) 2000-10-10 US disclosed
EP-0958328-A1 SILICONE RUBBER-CONTAINING, AFTERGLOWING PREPARATION, PRODUCT PROVIDED THEREWITH AND USE THEREOF Beele Engineering B.V. (NL) 1999-11-24 EP disclosed
WO-1998004645-A1 SILICONE RUBBER-CONTAINING, AFTERGLOWING PREPARATION, PRODUCT PROVIDED THEREWITH AND USE THEREOF BEELE ENGINEERING B.V. (NL) 1998-02-05 WO disclosed
EP-0466111-A1 Polymer mixture, process for its manufacture and its use in coatings DAINIPPON INK AND CHEMICALS, INC. (JP) 1992-01-15 EP disclosed
EP-0304301-A2 Process for preparing two-ply foam molded articles MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1989-02-22 EP disclosed