Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSK | P43235 | 3/20 | 0.34 |
| ▸ | TSHR | P16473 | 3/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | PRKCA | P17252 | 3/20 | 0.30 |
| ▸ | NOS1 | P29475 | 2/20 | 0.30 |
| ▸ | NOS3 | P29474 | 1/20 | 0.30 |
| ▸ | NOS2 | P35228 | 1/20 | 0.30 |
| ▸ | DGAT1 | O75907 | 1/20 | 0.30 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.30 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.30 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.30 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20241539 | 0.93 | CA12 (0.35) | CTSKTSHRCYP3A4CYP2C19SMN1; SMN2 | |
| SCHEMBL31612 | 0.92 | GRIK1 (0.35) | CTSKTSHRCYP3A4CYP2C19SMN1; SMN2 | |
| SCHEMBL5082914 | 0.92 | GRIK1 (0.35) | CTSKTSHRCYP3A4CYP2C19SMN1; SMN2 | |
| SCHEMBL27664481 | 0.91 | SMN1; SMN2 (0.31) | CTSKTSHRCYP3A4CYP2C19SMN1; SMN2 | |
| SCHEMBL9650643 | 0.91 | SMN1; SMN2 (0.41) | CTSKTSHRCYP3A4CYP2C19SMN1; SMN2 | |
| SCHEMBL7601657 | 0.90 | SMN1; SMN2 (0.32) | CTSKTSHRCYP3A4CYP2C19SMN1; SMN2 | |
| SCHEMBL8183510 | 0.90 | SMN1; SMN2 (0.32) | CTSKTSHRCYP3A4CYP2C19SMN1; SMN2 | |
| SCHEMBL14349106 | 0.82 | — | — | |
| SCHEMBL22205082 | 0.82 | TSHR (0.37) | CTSKTSHRCYP3A4CYP2C19SMN1; SMN2 | |
| SCHEMBL16574707 | 0.82 | TSHR (0.35) | CTSKTSHRCYP3A4CYP2C19SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110283103-B | Method for synthesizing α amino acid ester/amide by base-catalyzed decarboxylation amination | 北京理工大学 | 2020-08-04 | — | — | CN | claimed |
| WO-2004067623-A2 | POLYMIDE RESIN FOR NON-RUBBING VERTICAL ALIGNMENT MATERIALS AND PREPARATION METHOD THEREOF | KIM YONG-BAE (KR) | 2004-08-12 | — | — | WO | claimed |
| CN-110283103-B | Method for synthesizing α amino acid ester/amide by base-catalyzed decarboxylation amination | 北京理工大学 | 2020-08-04 | — | — | CN | disclosed |
| US-9291900-B2 | Composition for forming resist underlayer film, containing silicon that bears diketone-structure-containing organic group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-03-22 | — | — | US | disclosed |
| US-9291900-B2 | Composition for forming resist underlayer film, containing silicon that bears diketone-structure-containing organic group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-03-22 | — | — | US | disclosed |
| US-9291900-B2 | Composition for forming resist underlayer film, containing silicon that bears diketone-structure-containing organic group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-03-22 | — | — | US | disclosed |
| US-20150316849-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING ESTER GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-11-05 | — | — | US | disclosed |
| US-20150316849-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING ESTER GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-11-05 | — | — | US | disclosed |
| EP-2669737-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILMS, CONTAINING SILICON THAT BEARS DIKETONE-STRUCTURE-CONTAINING ORGANIC GROUP | Nissan Chemical Industries, Ltd. (JP) | 2013-12-04 | — | — | EP | disclosed |
| US-20130302991-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, CONTAINING SILICON THAT BEARS DIKETONE-STRUCTURE-CONTAINING ORGANIC GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-11-14 | — | — | US | disclosed |
| US-20130302991-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, CONTAINING SILICON THAT BEARS DIKETONE-STRUCTURE-CONTAINING ORGANIC GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-11-14 | — | — | US | disclosed |
| US-20130302991-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, CONTAINING SILICON THAT BEARS DIKETONE-STRUCTURE-CONTAINING ORGANIC GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-11-14 | — | — | US | disclosed |
| WO-2004067623-A2 | POLYMIDE RESIN FOR NON-RUBBING VERTICAL ALIGNMENT MATERIALS AND PREPARATION METHOD THEREOF | KIM YONG-BAE (KR) | 2004-08-12 | — | — | WO | disclosed |
| EP-1401820-A1 | 5-HT RECEPTOR LIGANDS AND USES THEREOF | Pfizer Products Inc. (US) | 2004-03-31 | — | — | EP | disclosed |
| WO-2003000666-A1 | 5-HT RECEPTOR LIGANDS AND USES THEREOF | PFIZER PRODUCTS INC. (US) | 2003-01-03 | — | — | WO | disclosed |