Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 4/20 | 0.73 |
| ▸ | CA2 | P00918 | 4/20 | 0.73 |
| ▸ | CA14 | Q9ULX7 | 4/20 | 0.73 |
| ▸ | CA9 | Q16790 | 3/20 | 0.73 |
| ▸ | CA3 | P07451 | 3/20 | 0.73 |
| ▸ | CA4 | P22748 | 3/20 | 0.73 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.73 |
| ▸ | CA1 | P00915 | 2/20 | 0.73 |
| ▸ | GLA | P06280 | 1/20 | 0.73 |
| ▸ | MMP3 | P08254 | 1/20 | 0.50 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.44 |
| ▸ | NPC1 | O15118 | 3/20 | 0.44 |
| ▸ | LMNA | P02545 | 3/20 | 0.44 |
| ▸ | CA5A | P35218 | 3/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.44 |
| ▸ | CA5B | Q9Y2D0 | 3/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phenol SCHEMBL7509994 | 0.97 | CA12 (0.69) | CA12CA2CA14CA9CA3 | |
| Phenol SCHEMBL8423518 | 0.91 | CA12 (0.61) | CA12CA2CA14CA9CA3 | |
| Phenol SCHEMBL868313 | 0.88 | CA12 (0.65) | CA12CA2CA14CA9CA3 | |
| Phenol SCHEMBL7750141 | 0.86 | CA12 (1.00) | CA12CA2CA14CA9CA3 | |
| Phenol SCHEMBL28575 | 0.86 | CA12 (1.00) | CA12CA2CA14CA9CA3 | |
| Phenol SCHEMBL14134295 | 0.86 | — | — | |
| Phenol SCHEMBL11067860 | 0.86 | CA12 (1.00) | CA12CA2CA14CA9CA3 | |
| Phenol SCHEMBL524026 | 0.86 | CA12 (1.00) | CA12CA2CA14CA9CA3 | |
| Phenol SCHEMBL48 | 0.86 | — | — | |
| Phenol SCHEMBL9470299 | 0.86 | CA12 (1.00) | CA12CA2CA14CA9CA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108102290-B | Graphene grafted modified phenolic resin material and preparation method thereof | 黑龙江大学 | 2020-04-17 | — | — | CN | claimed |
| CN-109564213-A | Detecting microbial wound infection | 西诺福有限公司 | 2019-04-02 | — | — | CN | claimed |
| JP-7270406-A | — | — | None | — | — | JP | disclosed |
| CN-109564213-B | Detecting microbial wound infection | 西诺福有限公司 | 2023-01-31 | — | — | CN | disclosed |
| CN-108102290-B | Graphene grafted modified phenolic resin material and preparation method thereof | 黑龙江大学 | 2020-04-17 | — | — | CN | disclosed |
| CN-108102289-B | Phenolic resin grafted carbon nanotube composite material and preparation method thereof | 黑龙江大学 | 2020-04-17 | — | — | CN | disclosed |
| CN-109564213-A | Detecting microbial wound infection | 西诺福有限公司 | 2019-04-02 | — | — | CN | disclosed |
| CN-104246610-B | Photocurable composition | 3M创新有限公司 | 2019-03-08 | — | — | CN | disclosed |
| CN-104520347-B | Photocurable compositions | 3M创新有限公司 | 2016-09-28 | — | — | CN | disclosed |
| US-9217920-B2 | Photocurable compositions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2015-12-22 | — | — | US | disclosed |
| US-20150248055-A1 | PHOTOCURABLE COMPOSITIONS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2015-09-03 | — | — | US | disclosed |
| US-5679766-A | Purification process of novolar resins using acid treated chelating cation exchange resin | SHIPLEY COMPANY, L.L.C. (US) | 1997-10-21 | — | — | US | disclosed |
| US-5525315-A | Process for removing heavy metal ions with a chelating cation exchange resin | SHIPLEY COMPANY, L.L.C. (US) | 1996-06-11 | — | — | US | disclosed |
| US-5518628-A | Purification process | SHIPLEY COMPANY INC. (US) | 1996-05-21 | — | — | US | disclosed |
| JP-H07270406-A | SYNTHETIC PHOSPHOLIPID REAGENT | ORTHO DIAGNOSTIC SYST INC | 1995-10-20 | — | — | JP | disclosed |
| US-5443736-A | Purification process | SHIPLEY COMPANY INC. (US) | 1995-08-22 | — | — | US | disclosed |
| US-5350714-A | Point-of-use purification | SHIPLEY COMPANY INC. (US) | 1994-09-27 | — | — | US | disclosed |
| US-5213917-A | Plasma processing with metal mask integration | SHIPLEY COMPANY INC. (US) | 1993-05-25 | — | — | US | disclosed |
| US-5053318-A | Coating substrate with photoresist, electroless plating of catalyst, exposure to radiation, development | SHIPLEY COMPANY INC. (US) | 1991-10-01 | — | — | US | disclosed |
| EP-0397988-A2 | Plasma processing with metal mask integration | SHIPLEY COMPANY INC. (US) | 1990-11-22 | — | — | EP | disclosed |