Phenol

Phenol

SCHEMBL8423518

Oc1ccccc1.[N-]=[N+]=N.[N-]=[N+]=[N-]

nearest known ligand 0.61

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 3/20 0.61
CA2 P00918 3/20 0.61
CA9 Q16790 3/20 0.61
CA14 Q9ULX7 3/20 0.61
CA1 P00915 2/20 0.61
CA3 P07451 2/20 0.61
CA4 P22748 2/20 0.61
TDP1 Q9NUW8 2/20 0.61
GLA P06280 1/20 0.61
MMP3 P08254 1/20 0.43
BCL2L1 Q07817 1/20 0.43
ESR1 P03372 9/20 0.39
ESR2 Q92731 9/20 0.39
MEN1 O00255 2/20 0.39
NPC1 O15118 2/20 0.39
KMT2A Q03164 2/20 0.39
LTA4H P09960 1/20 0.39
NR1H2 P55055 1/20 0.39
BAX Q07812 1/20 0.39
CES2 O00748 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phenol SCHEMBL868313 0.97 CA12 (0.65) CA12CA2CA9CA14CA1
Phenol SCHEMBL10495957 0.93 TDP1 (0.52) CA12CA2CA9CA14CA1
Phenol SCHEMBL6693969 0.91 CA12 (0.73) CA12CA2CA9CA14CA1
Phenol SCHEMBL7509994 0.88 CA12 (0.69) CA12CA2CA9CA14CA1
Phenol SCHEMBL27959061 0.85 CA12 (0.73) CA12CA2CA9CA14CA1
Phenol SCHEMBL29202825 0.85 CA12 (0.73) CA12CA2CA9CA14CA1
Phenol SCHEMBL27810625 0.78
Phenol SCHEMBL11067860 0.78 CA12 (1.00) CA12CA2CA9CA14CA1
Phenol SCHEMBL7750141 0.78 CA12 (1.00) CA12CA2CA9CA14CA1
Phenol SCHEMBL524026 0.78 CA12 (1.00) CA12CA2CA9CA14CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-59172643-A None JP disclosed
US-5958645-A ALKALI-SOLUBLE RESIN, PHENOL COMPOUND, 1,2-QUINONEDIAZIDE COMPOUND; RESOLUTION, SENSITIVITY, DEVELOPABILITY JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1999-09-28 US disclosed
JP-S59172643-A POSITIVE TYPE PHOTORESIST COMPOSITION SUMITOMO CHEM CO LTD 1984-09-29 JP disclosed