Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Phosphoric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phosphoric Acid SCHEMBL4534522 | 0.96 | SLC34A1 (0.50) | — | |
| Phosphoric Acid SCHEMBL40473 | 0.95 | — | — | |
| Phosphoric Acid SCHEMBL318412 | 0.95 | — | — | |
| Phosphoric Acid SCHEMBL2115953 | 0.95 | — | — | |
| Phosphoric Acid SCHEMBL7563266 | 0.91 | — | — | |
| Phosphoric Acid SCHEMBL1938107 | 0.91 | — | — | |
| Phosphoric Acid SCHEMBL22772184 | 0.91 | SLC34A1 (0.54) | — | |
| Phosphoric Acid SCHEMBL77418 | 0.91 | — | — | |
| Phosphoric Acid SCHEMBL18260583 | 0.91 | SLC34A1 (0.54) | — | |
| Phosphoric Acid SCHEMBL8924013 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180248178-A1 | ANODE MATERIALS FOR LITHIUM BATTERY OF IMPROVED TEMPERATURE PERFORMANCE | NANO AND ADVANCED MATERIALS INSTITUTE LIMITED (HK) | 2018-08-30 | — | — | US | disclosed |
| US-20160308212-A1 | APPROACH FOR MANUFACTURING EFFICIENT MESOPOROUS NANO-COMPOSITE POSITIVE ELECTRODE LiMn1-XFeXPO4 MATERIALS | NAT UNIV SINGAPORE (SG) | 2016-10-20 | — | — | US | disclosed |
| US-9385367-B2 | Approach for manufacturing efficient mesoporous nano-composite positive electrode LiMn1-xFexPO4 materials | NATIONAL UNIVERSITY OF SINGAPORE (SG) | 2016-07-05 | — | — | US | disclosed |
| US-9327990-B2 | Production of nanostructured Li4Ti5O12 with superior high rate performance | NATIONAL UNIVERSITY OF SINGAPORE (SG) | 2016-05-03 | — | — | US | disclosed |
| US-20140220448-A1 | PRODUCTION OF NANOSTRUCTURED LI4TI5O12 WITH SUPERIOR HIGH RATE PERFORMANCE | NATIONAL UNIVERSITY OF SINGAPORE (SG) | 2014-08-07 | — | — | US | disclosed |
| US-20140134490-A1 | APPROACH FOR MANUFACTURING EFFICIENT MESOPOROUS NANO-COMPOSITE POSITIVE ELECTRODE LiMn1-xFexPO4 MATERIALS | NATIONAL UNIVERSITY OF SINGAPORE (SG) | 2014-05-15 | — | — | US | disclosed |
| US-20130143123-A1 | MESOPOROUS METAL PHOSPHATE MATERIALS FOR ENERGY STORAGE APPLICATION | NATIONAL UNIVERSITY OF SINGAPORE (SG) | 2013-06-06 | — | — | US | disclosed |
| WO-2013002730-A1 | AN APPROACH FOR MANUFACTURING EFFICIENT MESOPOROUS NANO-COMPOSITE POSITIVE ELECTRODE LIMN1-XFEXPO4 MATERIALS | NATIONAL UNIVERSITY OF SINGAPORE (SG) | 2013-01-03 | — | — | WO | disclosed |
| WO-2013002729-A1 | PRODUCTION OF NANOSTRUCTURED LI4TI5O12 WITH SUPERIOR HIGH RATE PERFORMANCE | NATIONAL UNIVERSITY OF SINGAPORE (SG) | 2013-01-03 | — | — | WO | disclosed |
| WO-2012023904-A1 | MESOPOROUS METAL PHOSPHATE MATERIALS FOR ENERGY STORAGE APPLICATION | NATIONAL UNIVERSITY OF SINGAPORE (SG) | 2012-02-23 | — | — | WO | disclosed |
| US-20100086880-A1 | DEVELOPING SOLUTION AND METHOD FOR PRODUCTION OF FINELY PATTERNED MATERIAL | SONY CORPORATION (JP) | 2010-04-08 | — | — | US | disclosed |
| EP-2105798-A1 | DEVELOPING SOLUTION AND METHOD FOR PRODUCTION OF FINELY PATTERNED MATERIAL | Sony Corporation (JP) | 2009-09-30 | — | — | EP | disclosed |