Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.56 |
| ▸ | CA2 | P00918 | 1/20 | 0.56 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.56 |
| ▸ | CA4 | P22748 | 1/20 | 0.56 |
| ▸ | MAPT | P10636 | 2/20 | 0.49 |
| ▸ | HTT | P42858 | 1/20 | 0.49 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.48 |
| ▸ | TNKS | O95271 | 1/20 | 0.48 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.48 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.48 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.48 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.48 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.48 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.48 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.48 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.48 |
| ▸ | TNKS2 | Q9H2K2 | 1/20 | 0.48 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.48 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.48 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9817843 | 0.94 | NFKB1 (0.62) | CA1CA2NFKB1CA4MAPT | |
| SCHEMBL175543 | 0.94 | NFKB1 (0.62) | CA1CA2NFKB1CA4MAPT | |
| Fumaric Acid SCHEMBL11627288 | 0.84 | CA1 (0.52) | CA1CA2NFKB1CA4MAPT | |
| Maleic Acid SCHEMBL11627287 | 0.84 | CA1 (0.52) | CA1CA2NFKB1CA4MAPT | |
| SCHEMBL69543 | 0.84 | NFKB1 (0.75) | CA1CA2NFKB1CA4MAPT | |
| SCHEMBL459291 | 0.84 | NFKB1 (0.75) | CA1CA2NFKB1CA4MAPT | |
| SCHEMBL31197561 | 0.84 | NFKB1 (0.75) | CA1CA2NFKB1CA4MAPT | |
| Cinnamic Acid SCHEMBL11333815 | 0.83 | HCAR2 (0.73) | CA1CA2NFKB1CA4MAPT | |
| Hydrochloric Acid SCHEMBL8374050 | 0.82 | NFKB1 (0.72) | CA1CA2NFKB1CA4MAPT | |
| Bromide SCHEMBL8376004 | 0.82 | NFKB1 (0.72) | CA1CA2NFKB1CA4MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9217920-B2 | Photocurable compositions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2015-12-22 | — | — | US | disclosed |
| US-20150248055-A1 | PHOTOCURABLE COMPOSITIONS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2015-09-03 | — | — | US | disclosed |
| EP-2892938-A1 | PHOTOCURABLE COMPOSITIONS | 3M Innovative Properties Company (US) | 2015-07-15 | — | — | EP | disclosed |
| EP-2883109-A1 | PHOTOCURABLE COMPOSITIONS | 3M Innovative Properties Company (US) | 2015-06-17 | — | — | EP | disclosed |
| EP-2812758-A1 | PHOTOCURABLE COMPOSITION | 3M Innovative Properties Company (US) | 2014-12-17 | — | — | EP | disclosed |
| US-8883402-B2 | Photocurable compositions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2014-11-11 | — | — | US | disclosed |
| US-8715904-B2 | Photocurable composition | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2014-05-06 | — | — | US | disclosed |
| US-8703385-B2 | Photoresist composition | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2014-04-22 | — | — | US | disclosed |
| US-20140048741-A1 | FILTRATION MEDIA | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2014-02-20 | — | — | US | disclosed |
| WO-2014025716-A1 | PHOTOCURABLE COMPOSITIONS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2014-02-13 | — | — | WO | disclosed |
| EP-0915736-B1 | FILTER SHEET AND PROCESS FOR PURIFYING PHOTORESIST COMPOSITION EMPLOYING THE FILTER SHEET | CUNO INC (US) | 2003-10-15 | — | — | EP | disclosed |
| US-6576139-B1 | Comprising self-supporting cellulose fibers immobilized with particulate cation exchange resin | 3M INNOVATIVE PROPERTIES COMPANY | 2003-06-10 | — | — | US | disclosed |
| US-20030047507-A1 | Filter sheet and process for purifying photoresist composition employing the filter sheet | 3M INNOVATIVE PROPERTIES COMPANY | 2003-03-13 | — | — | US | disclosed |
| WO-2002000325-A2 | FILTER SHEET AND PROCESS FOR PURIFYING PHOTORESIST COMPOSITION EMPLOYING THE FILTER SHEET | CUNO INCORPORATED (US) | 2002-01-03 | — | — | WO | disclosed |
| US-6103122-A | FILTRATION OF PHOTORESISTS AND SELF-SUPPORTING FIBER MATRICES | CUNO INCORPORATED (US) | 2000-08-15 | — | — | US | disclosed |
| EP-0915736-A1 | FILTER SHEET AND PROCESS FOR PURIFYING PHOTORESIST COMPOSITION EMPLOYING THE FILTER SHEET | Cuno Incorporated (US) | 1999-05-19 | — | — | EP | disclosed |
| WO-1998004348-A1 | FILTER SHEET AND PROCESS FOR PURIFYING PHOTORESIST COMPOSITION EMPLOYING THE FILTER SHEET | CUNO INCORPORATED (US) | 1998-02-05 | — | — | WO | disclosed |
| US-5525315-A | Process for removing heavy metal ions with a chelating cation exchange resin | SHIPLEY COMPANY, L.L.C. (US) | 1996-06-11 | — | — | US | disclosed |
| US-5518628-A | Purification process | SHIPLEY COMPANY INC. (US) | 1996-05-21 | — | — | US | disclosed |
| US-5350714-A | Point-of-use purification | SHIPLEY COMPANY INC. (US) | 1994-09-27 | — | — | US | disclosed |