SCHEMBL6699073

SCHEMBL6699073

CC(C)C(C)(O)C(=O)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 5/20 0.50
SRC P12931 1/20 0.50
GAA P10253 1/20 0.46
LMNA P02545 1/20 0.44
MAPT P10636 1/20 0.44
XBP1 P17861 1/20 0.44
ATM Q13315 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
NPSR1 Q6W5P4 1/20 0.44
MLYCD O95822 1/20 0.44
TDP1 Q9NUW8 2/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
TSHR P16473 3/20 0.42
ALDH1A1 P00352 2/20 0.42
CYP1A2 P05177 2/20 0.42
CYP2D6 P10635 2/20 0.42
HSD17B10 Q99714 1/20 0.42
CES2 O00748 3/20 0.42
DAO P14920 1/20 0.42
NAPRT Q6XQN6 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26676881 0.83 SRC (0.43) CES1SRCLMNAMAPTXBP1
SCHEMBL8463346 0.83 CES1 (0.50) CES1SRCLMNAMAPTXBP1
SCHEMBL507732 0.83 CES1 (0.50) CES1SRCLMNAMAPTXBP1
SCHEMBL27384600 0.83 CES1 (0.50) CES1SRCGAALMNAMAPT
SCHEMBL28986444 0.80 SRC (0.44) CES1SRCLMNAMAPTSMN1; SMN2
SCHEMBL3003271 0.80 CES1 (0.52) CES1SRCLMNAMAPTXBP1
SCHEMBL9105008 0.79 CES1 (0.56) CES1SRCLMNAMAPTSMN1; SMN2
SCHEMBL11341422 0.79 CES1 (0.56) CES1SRCLMNAMAPTTDP1
SCHEMBL21310 0.79 CES1 (0.56) CES1SRCLMNAMAPTSMN1; SMN2
SCHEMBL1606581 0.79 CES1 (0.56) CES1SRCLMNAMAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114981278-A Compound and optical film comprising same 株式会社LG化学 2022-08-30 CN disclosed
CN-114450322-A Compound, binder resin, negative-type photosensitive resin composition, and display device including black bank formed using the negative-type photosensitive resin composition 株式会社LG化学 2022-05-06 CN disclosed
CN-114008055-A Compound and optical film comprising same 株式会社LG化学 2022-02-01 CN disclosed
CN-113993869-A Compound, photosensitive fluorescent resin composition comprising the same, color conversion film prepared using the same, backlight unit and display device 株式会社LG化学 2022-01-28 CN disclosed
CN-113924299-A Compound, photosensitive fluorescent resin composition comprising the same, color conversion film, backlight unit and display device manufactured therefrom 株式会社LG化学 2022-01-11 CN disclosed
CN-111051439-B Xanthene-based compound and photosensitive resin composition comprising the same 株式会社LG化学 2021-11-16 CN disclosed
CN-110337467-B Method for preparing colorant composition and colorant composition prepared thereby 株式会社LG化学 2021-08-27 CN disclosed
CN-111051439-A Xanthene-based compound and photosensitive resin composition comprising the same 株式会社LG化学 2020-04-21 CN disclosed
US-20040077744-A1 Irradiation polymerization of acrylamide and/or monomer blends in the presence of photoinintiators, to form water soluble polymers used as flocculants, flow control agents, coagulants, dispersants, superabsorbents or binders CIBA SPECIALTY CHEMICALS WATER TREATMENTS LIMITED (GB) 2004-04-22 US disclosed
EP-1368382-A1 POLYMERISATION PROCESS Ciba Specialty Chemicals Water Treatments Limited (GB) 2003-12-10 EP disclosed
WO-2002066520-A1 POLYMERISATION PROCESS CIBA SPECIALTY CHEMICALS WATER TREATMENTS LIMITED (GB) 2002-08-29 WO disclosed
US-4547394-A PHOTOINITIATORS FOR PHOTOPOLYMERIZATION MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1985-10-15 US disclosed