SCHEMBL6704060

SCHEMBL6704060

CC(C)(F)C(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18011037 0.80
SCHEMBL333796 0.80
SCHEMBL14890206 0.76
SCHEMBL18341554 0.76
SCHEMBL8636954 0.76
SCHEMBL1320186 0.74
SCHEMBL23421889 0.73
SCHEMBL1994642 0.73
SCHEMBL3713171 0.73
SCHEMBL5232123 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11916195-B2 Electrolyte solution, electrochemical device, lithium ion secondary battery, and module DAIKIN INDUSTRIES, LTD. (JP) 2024-02-27 US disclosed
US-20230387465-A1 COMPOUND, COMPOSITION, ELECTROCHEMICAL DEVICE, LITHIUM ION SECONDARY BATTERY AND MODULE DAIKIN INDUSTRIES, LTD. (JP) 2023-11-30 US disclosed
US-20230250046-A1 FLUORINATED CARBOXYLIC ACID SALT COMPOUND DAIKIN INDUSTRIES, LTD. (JP) 2023-08-10 US disclosed
US-20230129817-A1 ELECTROLYTE SOLUTION, ELECTROCHEMICAL DEVICE, LITHIUM ION SECONDARY BATTERY AND MODULE DAIKIN INDUSTRIES, LTD. (JP) 2023-04-27 US disclosed
US-10651286-B2 High selectivity nitride removal process based on selective polymer deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2020-05-12 US disclosed
US-20190305109-A1 HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION INTERNATIONAL BUSINESS MACHINES CORPORATION 2019-10-03 US disclosed
US-10325998-B2 High selectivity nitride removal process based on selective polymer deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2019-06-18 US disclosed
US-10269924-B2 High selectivity nitride removal process based on selective polymer deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2019-04-23 US disclosed
US-10090168-B2 Plasma etching method ZEON CORPORATION (JP) 2018-10-02 US disclosed
US-9923240-B2 Electrolyte solution, electrochemical device, lithium battery, and module DAIKIN INDUSTRIES, LTD. (JP) 2018-03-20 US disclosed
US-20130105996-A1 LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER ZEON CORPORATION (JP) 2013-05-02 US disclosed
EP-1524552-B1 Silver halide color photographic light-sensitive material FUJIFILM CORP (JP) 2009-08-19 EP disclosed
WO-2007148230-A2 GRAFTED POLYMERS AND USES THEREOF INTERFACE BIOLOGICS INCORPORATED (CA) 2007-12-27 WO disclosed
EP-1341035-B1 Silver halide color photographic light-sensitive material FUJIFILM CORP (JP) 2007-12-26 EP disclosed
JP-2004018851-A HYDROCARBON-BASED REFRIGERANT AND AUTOMOTIVE AIR CONDITIONER USING THE SAME TAKATO TECHNICA:KK 2004-01-22 JP disclosed
JP-2003268357-A HYDROCARBON COOLANT AND AIR CONDITIONER FOR AUTOMOBILE USING THE SAME TAKATO TECHNICA:KK 2003-09-25 JP disclosed
US-5705716-A COMPOUNDS FOR SOLVENTS AND BLOWING AGENTS ALLIEDSIGNAL INC. (US) 1998-01-06 US disclosed
US-5316690-A Blowing agents or solvents ALLIED SIGNAL INC. (US) 1994-05-31 US disclosed
US-5158617-A Method of cleaning using hydrochlorofluorocarbons having 3 to 5 carbon atoms ALLIED-SIGNAL INC. 1992-10-27 US disclosed
WO-1992016674-A2 A METHOD OF CLEANING USING HYDROCHLOROFLUOROCARBONS HAVING 3 TO 5 CARBON ATOMS ALLIED-SIGNAL INC. (US) 1992-10-01 WO disclosed