⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL338715 | 0.89 | — | — | |
| SCHEMBL27620118 | 0.89 | — | — | |
| SCHEMBL36346 | 0.89 | — | — | |
| SCHEMBL28687609 | 0.84 | — | — | |
| SCHEMBL23701679 | 0.80 | — | — | |
| SCHEMBL6887441 | 0.80 | — | — | |
| SCHEMBL5586427 | 0.80 | — | — | |
| SCHEMBL2762535 | 0.80 | — | — | |
| SCHEMBL4376282 | 0.80 | — | — | |
| SCHEMBL17557778 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1926668-B | Formation of a silicon oxynitride layer on a high-K dielectric material | APPLIED MATERIALS INC | 2010-09-01 | — | — | CN | disclosed |
| CN-1926668-A | Formation of a silicon oxynitride layer on a high-K dielectric material | APPLIED MATERIALS INC (US) | 2007-03-07 | — | — | CN | disclosed |
| US-20040007296-A1 | Casting of single crystal superalloy articles with reduced eutectic scale and grain recrystallization | HOWMET RESEARCH CORPORATION | 2004-01-15 | — | — | US | disclosed |
| US-20020007877-A1 | CASTING OF SINGLE CRYSTAL SUPERALLOY ARTICLES WITH REDUCED EUTECTIC SCALE AND GRAIN RECRYSTALLIZATION | HOWMET RESEARCH CORPORATION | 2002-01-24 | — | — | US | disclosed |
| EP-1038983-A1 | Single crystal nickel-base alloy | Howmet Research Corporation (US) | 2000-09-27 | — | — | EP | disclosed |
| US-5895768-A | LOW BUBBLE COUNT AND SIZE; SAFETY GLASS; HARD DISKS FOR INFORMATION STORAGE | SCHOTT GLASWERKE (DE) | 1999-04-20 | — | — | US | disclosed |