⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9241472 | 0.89 | — | — | |
| SCHEMBL28831262 | 0.89 | — | — | |
| SCHEMBL6883074 | 0.89 | — | — | |
| SCHEMBL17557778 | 0.89 | — | — | |
| SCHEMBL5092216 | 0.89 | — | — | |
| SCHEMBL2517318 | 0.89 | — | — | |
| SCHEMBL6704087 | 0.89 | — | — | |
| SCHEMBL6887441 | 0.89 | — | — | |
| SCHEMBL15213 | 0.87 | — | — | |
| SCHEMBL28982468 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 20625 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12641802-B2 | Liner to form composite high-K dielectric | APPLIED MATERIALS, INC. (US) | 2026-05-26 | — | — | US | claimed |
| US-12628383-B2 | Transistors having stacked 2D material channel layers and heterogeneous 2D material contacts layers epitaxial to the 2D material channel layers | INTEL CORPORATION (US) | 2026-05-12 | — | — | US | claimed |
| US-20260129886-A1 | SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO LTD (KR) | 2026-05-07 | — | — | US | claimed |
| US-12604484-B2 | Semiconductor device including data storage structure and method of manufacturing data storage structure | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-04-14 | — | — | US | claimed |
| US-20260090066-A1 | SEMICONDUCTOR DEVICE COMPRISING HIGH-K AMORPHOUS FLUORINATED CARBON THIN FILM GATE DIELECTRIC LAYER AND MANUFACTURING METHOD THEREOF | THE INDUSTRY & ACADEMIC COOPERATION IN CHUNGNAM NATIONAL UNIVERSITY (IAC) (KR) | 2026-03-26 | — | — | US | claimed |
| US-20260081089-A1 | BACKEND FIELD EMISSION DEVICES | SHARMA ABHISHEK A (US) | 2026-03-19 | — | — | US | claimed |
| US-20260068548-A1 | RESISTIVE SWITCHING STRUCTURE TO IMPROVE RRAM | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2026-03-05 | — | — | US | claimed |
| US-12550451-B2 | Electrostatic discharge prevention | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-02-10 | — | — | US | claimed |
| US-12527015-B2 | Semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-01-13 | — | — | US | claimed |
| US-20250329581-A1 | SEMICONDUCTOR DEVICE HAVING AIR GAP AND METHOD FOR MANUFACTURING THE SAME | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2025-10-23 | — | — | US | claimed |
| CN-88102109-A | Process for ammoxidation of paraffins and catalyst system therefor | — | 1988-11-23 | — | — | CN | claimed |
| CN-86108899-B | PROCESS FOR MANUFACTURE OF METAL SINTER | — | 1988-08-10 | — | — | CN | claimed |
| CN-86108842-A | The method of dewaxing catalyst and use titanoaluminosilicatmolecular molecular sieves | — | 1987-07-29 | — | — | CN | claimed |
| CN-85104670-A | The plate of material that is used for metal sinter is made the method for this plate and the method for manufacturing metal sinter | — | 1986-12-24 | — | — | CN | claimed |
| CN-85109629-A | Dewaxing catalyst using non-zeolite molecular sieve and its process | — | 1986-09-10 | — | — | CN | claimed |
| CN-85109635-A | Hydrocracking catalyst and process using non-zeolitic molecular sieves | — | 1986-09-10 | — | — | CN | claimed |
| CN-85109361-A | The cracking method of catalytic cracking catalyst and application mix catalyst system | — | 1986-08-27 | — | — | CN | claimed |
| CN-85109362-A | The cracking method of catalytic cracking catalyst and applying silicon aluminophosphate molecular sieve | — | 1986-08-27 | — | — | CN | claimed |
| CN-85109634-A | The method of hydrocracking catalyst and application alumo-silicate molecular sieve | — | 1986-06-10 | — | — | CN | claimed |
| CN-85109627-A | Adopt silicoaluminophosphamolecular molecular sieve as dewaxing catalyst and technology thereof | — | 1986-06-10 | — | — | CN | claimed |