Hydrazine

Hydrazine

SCHEMBL6709964

CC(C)OS(=O)(=O)O.NN

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.48
CA2 P00918 3/20 0.39
CA1 P00915 2/20 0.39
CA9 Q16790 2/20 0.39
TSHR P16473 2/20 0.32
NT5E P21589 1/20 0.32
CA4 P22748 1/20 0.32
CA6 P23280 1/20 0.32
CA5A P35218 1/20 0.32
CA7 P43166 1/20 0.32
CA5B Q9Y2D0 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
TP53 P04637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydroxyamine SCHEMBL27595862 0.94 ALDH1A1 (0.48) ALDH1A1CA2CA1CA9TSHR
SCHEMBL374821 0.94
SCHEMBL3883756 0.91
Iodide SCHEMBL30510675 0.91
Water SCHEMBL6689986 0.91
SCHEMBL17456489 0.91
SCHEMBL17456377 0.91
Ammonia Solution, Strong SCHEMBL833018 0.91
SCHEMBL28934634 0.91
Sulfuric Acid SCHEMBL28899813 0.88 ALDH1A1 (0.48) ALDH1A1CA2CA1CA9TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122029305-A Plating film for metal sintering bonding, method for producing the same, and semiconductor mounting substrate 奥野制药工业株式会社 2026-05-12 CN disclosed
WO-2025079303-A1 PLATING FILM FOR METAL SINTERING BONDING, METHOD FOR MANUFACTURING SAME, AND SEMICONDUCTOR MOUNTING SUBSTRATE 奥野製薬工業株式会社 2025-04-17 WO disclosed
WO-2022253252-A1 HETEROCYCLIC COMPOUNDS USEFUL AS HPK1 INHIBITORS SILEXON BIOTECH CO., LTD. (CN) 2022-12-08 WO disclosed
CN-102149543-B Deoxygenating laminate MITSUBISHI GAS CHEMICAL CO 2014-09-03 CN disclosed
CN-102131641-B Deoxidizing multilayered body MITSUBISHI GAS CHEMICAL CO 2013-11-13 CN disclosed
CN-102149543-A Deoxygenating laminate MITSUBISHI GAS CHEMICAL CO 2011-08-10 CN disclosed
CN-102131641-A Deoxidizing multilayered body MITSUBISHI GAS CHEMICAL CO 2011-07-20 CN disclosed
US-20040211291-A1 Method of manufacturing fine metal particles, substance containing fine metal particles, and paste solder composition TAMURA KAKEN CORPORATION (JP) 2004-10-28 US disclosed
US-20030047034-A1 Method of manufacturing fine metal particles, substance containing fine metal particles, and paste solder composition TAMURA KAKEN CORPORATION (JP) 2003-03-13 US disclosed
EP-1245315-A1 Method of manufacturing fine metal particles, substance containing fine metal particles and paste solder composition Tamura Kaken Corporation (JP) 2002-10-02 EP disclosed