SCHEMBL6718010

SCHEMBL6718010

C=CS(=O)(=O)Oc1cccc2ccccc12

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.41
KDM4E B2RXH2 3/20 0.41
HPGD P15428 2/20 0.41
TDP1 Q9NUW8 1/20 0.41
HSD17B10 Q99714 3/20 0.40
PGR P06401 1/20 0.40
GAA P10253 1/20 0.40
PTGS1 P23219 1/20 0.40
MAPK1 P28482 1/20 0.40
ATM Q13315 1/20 0.40
HTR1B P28222 4/20 0.40
KMT2A Q03164 4/20 0.39
MEN1 O00255 3/20 0.39
RAB9A P51151 2/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
CA9 Q16790 1/20 0.39
KCNA3 P22001 1/20 0.38
OGG1 O15527 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28129713 0.98 ALDH1A1 (0.40) ALDH1A1KDM4EHPGDTDP1HSD17B10
SCHEMBL28129182 0.98 ALDH1A1 (0.40) ALDH1A1KDM4EHPGDTDP1HSD17B10
SCHEMBL28129719 0.90 HPRT1 (0.44) ALDH1A1KDM4EHPGDTDP1HSD17B10
SCHEMBL28129714 0.89 HPRT1 (0.42) ALDH1A1KDM4EHPGDTDP1HSD17B10
SCHEMBL28129678 0.89 HPRT1 (0.42) ALDH1A1KDM4EHPGDTDP1HSD17B10
SCHEMBL8752166 0.85 ALDH1A1 (0.37) ALDH1A1KDM4EHPGDHSD17B10GAA
SCHEMBL311749 0.84 ALDH1A1 (0.42) ALDH1A1KDM4EHPGDTDP1HSD17B10
SCHEMBL28129706 0.83 ALDH1A1 (0.36) ALDH1A1KDM4EHPGDHSD17B10GAA
SCHEMBL28129174 0.83 ALDH1A1 (0.36) ALDH1A1KDM4EHPGDHSD17B10GAA
SCHEMBL1253062 0.82 ALDH1A1 (0.41) ALDH1A1KDM4EHPGDTDP1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240332519-A1 CONDUCTIVE MATERIAL PASTE FOR NON-AQUEOUS ELECTROLYTE SOLUTION SECONDARY BATTERY, SLURRY COMPOSITION FOR NON-AQUEOUS ELECTROLYTE SOLUTION SECONDARY BATTERY NEGATIVE ELECTRODE, NEGATIVE ELECTRODE FOR NON-AQUEOUS ELECTROLYTE SOLUTION SECONDARY BATTERY, AND NON-AQUEOUS ELECTROLYTE SOLUTION SECONDARY BATTERY ZEON CORPORATION (JP) 2024-10-03 US disclosed
EP-4379855-A1 CONDUCTIVE MATERIAL PASTE FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY, SLURRY COMPOSITION FOR NEGATIVE ELECTRODE OF NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY, NEGATIVE ELECTRODE FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY, AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY Zeon Corporation (JP) 2024-06-05 EP disclosed
CN-117916915-A Binder composition for electrochemical element positive electrode, conductive material dispersion liquid for electrochemical element positive electrode, slurry composition for electrochemical element positive electrode, positive electrode for electrochemical element, and electrochemical element 日本瑞翁株式会社 2024-04-19 CN disclosed
CN-107922765-B Photocurable ink composition 惠普发展公司,有限责任合伙企业 2020-10-16 CN disclosed
WO-2020045387-A1 GEL MATERIAL 国立大学法人北海道大学 2020-03-05 WO disclosed
EP-3363645-B1 PRETREATMENT OF UV CURED INK UNDER-LAYERS XEROX CORP (US) 2019-10-23 EP disclosed
US-10364364-B2 Photo curable ink composition HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2019-07-30 US disclosed
CN-106459653-B Hydrophily monofilm 三井化学株式会社 2019-03-01 CN disclosed
CN-104177923-B Ultraviolet curing water-based ink, print cartridge, recording device and recording method 富士施乐株式会社 2019-01-29 CN disclosed
CN-105814092-B Composition for hydrophilic cured product 三井化学株式会社 2018-09-21 CN disclosed
US-5079081-A Reaction product of hydrocarbyl substituted carboxylic acid or anhydride and a sulfo compound THE LUBRIZOL CORPORATION (US) 1992-01-07 US disclosed
EP-0452472-A1 CURABLE AMINOPLAST COMPOSITIONS AND CATALYSTS FOR CURING SAME. LUBRIZOL CORP (US) 1991-10-23 EP disclosed
WO-1991014043-A1 COMPOSITIONS AND POLYMER FABRICS TREATED WITH THE SAME THE LUBRIZOL CORPORATION (US) 1991-09-19 WO disclosed
WO-1991014042-A1 COMPOSITIONS AND POLYMER FABRICS TREATED WITH THE SAME THE LUBRIZOL CORPORATION (US) 1991-09-19 WO disclosed
US-5037533-A Ore flotation process and use of phosphorus containing sulfo compounds THE LUBRIZOL CORPORATION (US) 1991-08-06 US disclosed
US-5025085-A Sulfinic or sulfonic acids and derivatives THE LUBRIZOL CORPORATION (US) 1991-06-18 US disclosed
WO-1991006597-A1 CURABLE AMINOPLAST COMPOSITIONS AND CATALYSTS FOR CURING SAME THE LUBRIZOL CORPORATION (US) 1991-05-16 WO disclosed
US-4985239-A Microlatex hair cosmetic composition KAO CORPORATION (JP) 1991-01-15 US disclosed
US-4798721-A LATEX, WATER INSOLUBLE MONOMERS KAO CORPORATION (JP) 1989-01-17 US disclosed
EP-0214626-A2 Hair cosmetic composition Kao Corporation (JP) 1987-03-18 EP disclosed