SCHEMBL6721075

SCHEMBL6721075

CC(C)(C)C(C)(C)C(=O)Oc1ccc(-c2ccccc2)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 8/20 0.53
LMNA P02545 3/20 0.47
MAPT P10636 3/20 0.47
NPC1 O15118 1/20 0.47
CASP3 P42574 1/20 0.47
SENP8 Q96LD8 1/20 0.47
SENP7 Q9BQF6 1/20 0.47
SENP6 Q9GZR1 1/20 0.47
GAA P10253 2/20 0.47
CYP1A2 P05177 1/20 0.47
CYP2C9 P11712 1/20 0.47
PKM P14618 1/20 0.47
CYP2C19 P33261 1/20 0.47
MEN1 O00255 3/20 0.46
KMT2A Q03164 3/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
TDP1 Q9NUW8 3/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
HSD17B10 Q99714 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16005531 0.87 ELANE (0.69) ELANELMNAMAPTNPC1CASP3
SCHEMBL12128723 0.84 ELANE (0.51) ELANELMNAMAPTNPC1CASP3
SCHEMBL6721082 0.83 MAPT (0.59) ELANEMAPTPKMMEN1KMT2A
SCHEMBL20345309 0.82 ELANE (0.59) ELANEMAPTGAAMEN1KMT2A
SCHEMBL23747261 0.81 ELANE (0.49) ELANELMNAMAPTNPC1CASP3
SCHEMBL683318 0.81 ELANE (0.50) ELANELMNAMAPTNPC1CASP3
SCHEMBL9543659 0.79 HDAC1 (0.50) ELANELMNAMAPTNPC1GAA
SCHEMBL9541895 0.79 KMT2A (0.49) ELANELMNAMAPTNPC1CASP3
SCHEMBL14793006 0.79 ELANE (0.44) ELANELMNAMAPTNPC1CASP3
SCHEMBL6721081 0.79 KMT2A (0.53) ELANEMAPTNPC1CASP3SENP8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed