Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 5/20 | 0.59 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.59 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.59 |
| ▸ | ELANE | P08246 | 6/20 | 0.55 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.51 |
| ▸ | PKM | P14618 | 1/20 | 0.51 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 2/20 | 0.49 |
| ▸ | TMPRSS15 | P98073 | 2/20 | 0.49 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.49 |
| ▸ | ACR | P10323 | 1/20 | 0.49 |
| ▸ | NSD2 | O96028 | 1/20 | 0.46 |
| ▸ | RAB9A | P51151 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16300513 | 0.87 | ELANE (0.73) | MAPTTDP1L3MBTL1ELANEPARP10 | |
| SCHEMBL6721075 | 0.83 | ELANE (0.53) | MAPTTDP1L3MBTL1ELANEKMT2A | |
| SCHEMBL6721014 | 0.83 | MAPT (0.58) | MAPTTDP1L3MBTL1ELANEPARP10 | |
| SCHEMBL825366 | 0.81 | MAPT (0.56) | MAPTTDP1L3MBTL1ELANEPARP10 | |
| SCHEMBL8205435 | 0.80 | PARP10 (0.78) | MAPTTDP1L3MBTL1ELANEPARP10 | |
| SCHEMBL70034 | 0.80 | PARP10 (0.70) | MAPTTDP1L3MBTL1PARP10KMT2A | |
| SCHEMBL5705949 | 0.80 | MAPT (0.63) | MAPTTDP1L3MBTL1ELANEPARP10 | |
| SCHEMBL6721074 | 0.80 | ELANE (0.55) | MAPTL3MBTL1ELANEKMT2ASMN1; SMN2 | |
| SCHEMBL26375073 | 0.79 | PARP10 (0.65) | MAPTTDP1L3MBTL1PARP10KMT2A | |
| SCHEMBL68278 | 0.79 | PARP10 (0.63) | MAPTTDP1L3MBTL1PARP10KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8182975-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-20080248419-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |