Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AGXT | P21549 | 2/20 | 0.39 |
| ▸ | HRH3 | Q9Y5N1 | 8/20 | 0.39 |
| ▸ | DRD3 | P35462 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.37 |
| ▸ | PTPN7 | P35236 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16300520 | 0.85 | AGXT (0.41) | AGXTHRH3DRD3NPC1HPGD | |
| SCHEMBL6721046 | 0.82 | HRH3 (0.46) | AGXTHRH3DRD3NPC1HPGD | |
| SCHEMBL14048931 | 0.81 | RAB9A (0.45) | AGXTHRH3DRD3NPC1HPGD | |
| SCHEMBL6503405 | 0.67 | CYP1A2 (0.44) | AGXTHRH3DRD3NPC1HPGD | |
| SCHEMBL7187755 | 0.66 | AGXT (0.47) | AGXTHRH3DRD3NPC1RAB9A | |
| SCHEMBL27664392 | 0.66 | AGXT (0.44) | AGXTHRH3DRD3NPC1RAB9A | |
| SCHEMBL13978367 | 0.65 | AGXT (0.64) | AGXTHRH3DRD3NPC1RAB9A | |
| SCHEMBL12251011 | 0.64 | AGXT (0.57) | AGXTHRH3DRD3NPC1RAB9A | |
| SCHEMBL470912 | 0.62 | KDM4E (0.58) | AGXTHRH3DRD3NPC1RAB9A | |
| SCHEMBL13301363 | 0.62 | KDM4E (0.61) | AGXTHRH3DRD3NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8182975-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-20080248419-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |