SCHEMBL6721673

SCHEMBL6721673

CCC(OC(=O)c1ccccc1)C(C)(C)CC

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.51
KMT2A Q03164 1/20 0.51
CYP2D6 P10635 2/20 0.50
CYP1A2 P05177 1/20 0.50
CYP2C19 P33261 1/20 0.50
TSHR P16473 3/20 0.47
TP53 P04637 1/20 0.47
ALDH1A1 P00352 4/20 0.45
TDP1 Q9NUW8 3/20 0.45
LMNA P02545 3/20 0.45
HSD17B10 Q99714 1/20 0.45
MAPT P10636 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
KCNH2 Q12809 1/20 0.44
PDCD1 Q15116 1/20 0.42
CD274 Q9NZQ7 1/20 0.42
HTR1A P08908 1/20 0.42
SCN1A P35498 1/20 0.42
SLC6A3 Q01959 1/20 0.42
SCN5A Q14524 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1072649 0.89 MEN1 (0.50) MEN1KMT2ACYP2D6CYP1A2CYP2C19
SCHEMBL1071211 0.87 MEN1 (0.51) MEN1KMT2ACYP2D6CYP1A2CYP2C19
SCHEMBL1070688 0.87 MEN1 (0.54) MEN1KMT2ACYP2D6CYP1A2CYP2C19
SCHEMBL560900 0.86 MAPK1 (0.54) MEN1KMT2ACYP2D6CYP1A2CYP2C19
SCHEMBL1784502 0.84 CYP2D6 (0.54) MEN1KMT2ACYP2D6CYP1A2CYP2C19
SCHEMBL18759621 0.82 KMT2A (0.44) MEN1KMT2ACYP2D6CYP1A2CYP2C19
SCHEMBL1785294 0.81 MEN1 (0.49) MEN1KMT2ACYP2D6CYP1A2CYP2C19
SCHEMBL1783513 0.81 MEN1 (0.46) MEN1KMT2ACYP2D6CYP1A2CYP2C19
SCHEMBL1785935 0.80 CYP2D6 (0.50) MEN1KMT2ACYP2D6CYP1A2CYP2C19
SCHEMBL1784701 0.80 MEN1 (0.48) MEN1KMT2ACYP2D6CYP1A2CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed