Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 2/20 | 0.38 |
| ▸ | TSHR | P16473 | 7/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.35 |
| ▸ | TP53 | P04637 | 4/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | MGLL | Q99685 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13979429 | 0.83 | CYP1A2 (0.35) | CYP1A2TSHRALDH1A1HPGD | |
| SCHEMBL15274775 | 0.81 | TSHR (0.39) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL14303452 | 0.81 | CYP1A2 (0.39) | CYP1A2TSHRALDH1A1HPGD | |
| SCHEMBL18014867 | 0.81 | HCAR2 (0.40) | CYP1A2CA1CA9MGLL | |
| SCHEMBL18014847 | 0.80 | CYP1A2 (0.39) | CYP1A2CA1CA9MGLL | |
| SCHEMBL18014861 | 0.80 | L3MBTL1 (0.43) | CYP1A2ALDH1A1CA1CA9MGLL | |
| SCHEMBL18014859 | 0.80 | CYP1A2 (0.39) | CYP1A2CA1CA9MGLL | |
| SCHEMBL18014858 | 0.80 | CYP1A2 (0.39) | CYP1A2CA1CA9MGLL | |
| SCHEMBL26360493 | 0.78 | CYP1A2 (0.45) | CYP1A2TSHRALDH1A1TP53CYP3A4 | |
| Acrylic Acid Methyl Ester SCHEMBL28088518 | 0.77 | CYP1A2 (0.42) | CYP1A2TSHRSMN1; SMN2HPGDCA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102311371-B | Compound, polymer comprising the same and chemically amplified resist composition comprising the polymer | KOREA KUMHO PETROCHEM CO LTD | 2014-12-10 | — | — | CN | disclosed |
| US-8778575-B2 | Curable composition, color filter using the same and manufacturing method therefor, and solid image pickup element | FUJIFILM CORPORATION (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8778575-B2 | Curable composition, color filter using the same and manufacturing method therefor, and solid image pickup element | FUJIFILM CORPORATION (JP) | 2014-07-15 | — | — | US | disclosed |
| CN-103772341-A | Novel acryl monomer, polymer and resist composition comprising same | KOREA KUMHO PETROCHEM CO LTD | 2014-05-07 | — | — | CN | disclosed |
| CN-103172518-A | Novel acryl monomer, polymer and resist composition comprising same | KOREA KUMHO PETROCHEM CO LTD | 2013-06-26 | — | — | CN | disclosed |
| CN-101462956-A | (meth)acrylate compound having aromatic acid labile group, photosensitive polymer, resist composition, and associated methods | CHEIL IND INC (KR) | 2009-06-24 | — | — | CN | disclosed |
| CN-101462957-A | Aromatic (meth)acrylate compound having an alpha-hydroxy, photosensitive polymer, resist compositions, and associated methods | CHEIL IND INC (KR) | 2009-06-24 | — | — | CN | disclosed |
| US-20080171272-A1 | CURABLE COMPOSITION, COLOR FILTER USING THE SAME AND MANUFACTUIRNG METHOD THEREFOR, AND SOLID IMAGE PICKUP ELEMENT | FUJIFILM CORPORATION (JP) | 2008-07-17 | — | — | US | disclosed |
| US-20080171272-A1 | CURABLE COMPOSITION, COLOR FILTER USING THE SAME AND MANUFACTUIRNG METHOD THEREFOR, AND SOLID IMAGE PICKUP ELEMENT | FUJIFILM CORPORATION (JP) | 2008-07-17 | — | — | US | disclosed |
| US-6753124-B2 | AMPLIFIED POSITIVE PHOTORESISTS | JSR CORPORATION (JP) | 2004-06-22 | — | — | US | disclosed |
| US-6677419-B1 | REACTING STOICHIOMETRIC EXCESS OF UNSATURATED ALICYCLIC MONOMER WITH ANOTHER UNSATURATED MONOMER, HAVING LESS THAN TWO ELECTRON-WITHDRAWING GROUPS APPENDED TO UNSATURATION, IN PRESENCE OF FREE RADICAL INITIATOR | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-01-13 | — | — | US | disclosed |
| US-20020009667-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |