Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 1/20 | 0.58 |
| ▸ | P2RX4 | Q99571 | 4/20 | 0.50 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.48 |
| ▸ | HDAC6 | Q9UBN7 | 3/20 | 0.48 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.48 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.47 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.47 |
| ▸ | CA1 | P00915 | 3/20 | 0.43 |
| ▸ | CA2 | P00918 | 3/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6722016 | 0.91 | P2RX4 (0.64) | CYP19A1P2RX4PTPN1HDAC6HDAC3 | |
| SCHEMBL10178502 | 0.83 | CYP19A1 (0.53) | CYP19A1P2RX4 | |
| SCHEMBL27870508 | 0.82 | CYP19A1 (0.59) | CYP19A1P2RX4PTPN1HDAC6HDAC3 | |
| SCHEMBL17954557 | 0.82 | PPARG (0.44) | CYP19A1 | |
| SCHEMBL15722851 | 0.81 | SMPD1 (0.44) | — | |
| SCHEMBL13957035 | 0.80 | CYP19A1 (0.86) | CYP19A1P2RX4HDAC6HDAC3HDAC1 | |
| SCHEMBL17954553 | 0.80 | CYP19A1 (0.39) | CYP19A1P2RX4PTPN1 | |
| SCHEMBL17862210 | 0.79 | CYP19A1 (0.70) | CYP19A1P2RX4HDAC6HDAC3HDAC1 | |
| SCHEMBL29750434 | 0.79 | CYP19A1 (0.70) | CYP19A1P2RX4HDAC6HDAC3HDAC1 | |
| SCHEMBL10349679 | 0.79 | MAPT (0.42) | HDAC6HDAC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9612535-B2 | Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-04-04 | — | — | US | disclosed |
| WO-2016116530-A1 | COMPOSITIONS, IN PARTICULAR FOR USE IN OPTOELECTRONIC COMPONENTS | CYNORA GMBH (DE) | 2016-07-28 | — | — | WO | disclosed |
| US-9323150-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-04-26 | — | — | US | disclosed |
| US-20150370170-A1 | PATTERN FORMING METHOD, ELECTRON BEAM- OR EXTREME ULTRAVIOLET-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-12-24 | — | — | US | disclosed |
| US-9188862-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same | FUJIFILM CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| US-20140295332-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2014-10-02 | — | — | US | disclosed |
| US-20140227636-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-08-14 | — | — | US | disclosed |
| US-8221959-B2 | An aluminum support having a hydrophilic surface; photosensitive layer comprising a binder polymer comprising a pigment dispersed with a dispersant which is free from a carboxyl, phosphonate, or phosphate group; antisoilants, durability, discoloration inhibition | FUJIFILM CORPORATION (JP) | 2012-07-17 | — | — | US | disclosed |
| US-8182975-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20080248419-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080026324-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD FOR PREPARATION OF LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2008-01-31 | — | — | US | disclosed |