Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 15/20 | 0.59 |
| ▸ | ESR2 | Q92731 | 13/20 | 0.59 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.46 |
| ▸ | AR | P10275 | 2/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | TYR | P14679 | 1/20 | 0.46 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.46 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.46 |
| ▸ | HTR6 | P50406 | 1/20 | 0.46 |
| ▸ | ESRRG | P62508 | 1/20 | 0.46 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.46 |
| ▸ | SHBG | P04278 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31618446 | 0.78 | ESR1 (0.70) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL199692 | 0.77 | ESR1 (0.65) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL26168 | 0.77 | ESR1 (0.58) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL69106 | 0.77 | ESR1 (0.65) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL27850728 | 0.75 | ESR1 (0.63) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL1334149 | 0.75 | ESR1 (0.83) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL673356 | 0.74 | ESR1 (0.68) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL272801 | 0.74 | ESR1 (1.00) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL10452283 | 0.73 | ESR1 (0.61) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL11681932 | 0.73 | ESR1 (0.54) | ESR1ESR2CYP3A4ARLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2648191-B1 | INSULATED WIRE AND CABLE | FUJIKURA LTD (JP) | 2019-02-13 | — | — | EP | claimed |
| WO-2024048481-A1 | COMPOSITION, RESIN COMPOSITION, AND CURED PRODUCT | 三菱瓦斯化学株式会社 | 2024-03-07 | — | — | WO | disclosed |
| US-11325998-B2 | Method for preparing vinyl chloride-based polymer and vinyl chloride-based polymer prepared therefrom | LG CHEM, LTD. (KR) | 2022-05-10 | — | — | US | disclosed |
| EP-3730523-B1 | METHOD FOR PRODUCING VINYL CHLORIDE POLYMER AND VINYL CHLORIDE POLYMER PRODUCED THEREFROM | LG CHEMICAL LTD (KR) | 2022-02-23 | — | — | EP | disclosed |
| US-20210171674-A1 | METHOD FOR PREPARING VINYL CHLORIDE-BASED POLYMER AND VINYL CHLORIDE-BASED POLYMER PREPARED THEREFROM | LG CHEM, LTD. (KR) | 2021-06-10 | — | — | US | disclosed |
| EP-3730523-A1 | METHOD FOR PRODUCING VINYL CHLORIDE POLYMER AND VINYL CHLORIDE POLYMER PRODUCED THEREFROM | LG CHEM, LTD. (KR) | 2020-10-28 | — | — | EP | disclosed |
| US-6677409-B2 | POLYMERIZING A VINYL MONOMER VIA A RADICAL REACTION, ADDING A 2,6-DI-TERT-BUTYL-4-ALKYLPHENOL AS REACTION INHIBITOR IN AN AQUEOUS DISPERSION TO THE POLYMERIZATION SYSTEM; NONBLOCKING; MAKING POLYVINYL CHLORIDE FOR EXAMPLE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-01-13 | — | — | US | disclosed |
| US-6639027-B2 | Preferred reaction inhibitors with melting points of no more than 40 degrees C. include 2,6-di-tert-buty-4-sec-butylphenol, 2,6-di-tert-butyl-4-nonylphenol and 2,4-dimethyl-6-(1-methylpentadecyl) phenol | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-10-28 | — | — | US | disclosed |
| US-20030153696-A1 | Production process for vinyl-based polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-08-14 | — | — | US | disclosed |
| US-20020183463-A1 | Method of producing vinyl-based polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-12-05 | — | — | US | disclosed |
| EP-0530663-B1 | Heat sensitive recording material | HODOGAYA CHEMICAL CO LTD (JP) | 1996-11-06 | — | — | EP | disclosed |
| EP-0530663-A1 | Heat sensitive recording material | HODOGAYA CHEMICAL CO., LTD. (JP) | 1993-03-10 | — | — | EP | disclosed |
| EP-0183552-B2 | A PHOTOPOLYMERIZABLE COMPOSITION | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1991-10-16 | — | — | EP | disclosed |
| EP-0183552-B1 | A PHOTOPOLYMERIZABLE COMPOSITION | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1988-03-16 | — | — | EP | disclosed |
| EP-0183552-A2 | A photopolymerizable composition | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1986-06-04 | — | — | EP | disclosed |
| US-4468453-A | Dry process for forming an image | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1984-08-28 | — | — | US | disclosed |
| US-4266005-A | Photosensitive elastomeric composition | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1981-05-05 | — | — | US | disclosed |
| US-4197130-A | Photosensitive elastomeric composition and element | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1980-04-08 | — | — | US | disclosed |