⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4404945 | 0.83 | CYP2D6 (0.32) | — | |
| SCHEMBL8613888 | 0.83 | SLC6A4 (0.31) | — | |
| SCHEMBL8466389 | 0.79 | — | — | |
| SCHEMBL7702568 | 0.78 | — | — | |
| SCHEMBL7638347 | 0.78 | HPSE (0.33) | — | |
| SCHEMBL7696960 | 0.76 | — | — | |
| SCHEMBL9802837 | 0.76 | — | — | |
| SCHEMBL15387666 | 0.75 | — | — | |
| SCHEMBL22654020 | 0.74 | TMEM97 (0.35) | — | |
| SCHEMBL14246708 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6835527-B2 | Lithography; forming semiconductors | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-12-28 | — | — | US | disclosed |
| US-6677102-B2 | RESOLUTION, SENSITIVITY | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-01-13 | — | — | US | disclosed |
| US-20030039918-A1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-02-27 | — | — | US | disclosed |
| US-20020168583-A1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2002-11-14 | — | — | US | disclosed |
| US-20020155378-A1 | Chemical amplifying type positive resist compositions | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2002-10-24 | — | — | US | disclosed |