SCHEMBL7638347

SCHEMBL7638347

CCCCC12C=CC(CC1C(=O)O)C2

nearest known ligand 0.36

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HPSE Q9Y251 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8466389 0.89
SCHEMBL5395254 0.88 KMT2A (0.30)
SCHEMBL8613888 0.87 SLC6A4 (0.31)
SCHEMBL7696960 0.86
SCHEMBL4404945 0.84 CYP2D6 (0.32)
SCHEMBL296305 0.82
SCHEMBL6744683 0.81
SCHEMBL6727387 0.78
SCHEMBL6743579 0.78
SCHEMBL7702568 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101547895-B Photoactive compounds AZ ELECTRONIC MATERIALS USA 2014-12-03 CN disclosed
CN-102161637-B Photoactive compound AZ ELECTRONIC MATERIALS USA 2013-03-13 CN disclosed
CN-102161635-B Photoactive compound AZ ELECTRONIC MATERIALS USA 2013-01-02 CN disclosed
US-6462158-B1 USEFUL AS BASE POLYMERS FOR RESIST MATERIALS FOR AN EXPOSURE LIGHT SOURCE OF A SHORT WAVELENGTH MARUZEN PETROCHEMICAL CO., LTD. (JP) 2002-10-08 US disclosed
JP-2001081141-A COPOLYMER FOR PHOTORESIST AND ITS PRODUCTION, PHOTORESIST COMPOSITION, METHOD FOR FORMING PHOTORESIST PATTERN AND SEMICONDUCTOR ELEMENT HYUNDAI ELECTRONICS IND CO LTD 2001-03-27 JP disclosed