Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.55 |
| ▸ | MYC | P01106 | 1/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | RORC | P51449 | 1/20 | 0.39 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.38 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.38 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.38 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.36 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.36 |
| ▸ | MMP1 | P03956 | 1/20 | 0.36 |
| ▸ | MMP2 | P08253 | 1/20 | 0.36 |
| ▸ | MMP9 | P14780 | 1/20 | 0.36 |
| ▸ | MMP8 | P22894 | 1/20 | 0.36 |
| ▸ | MMP12 | P39900 | 1/20 | 0.36 |
| ▸ | MMP13 | P45452 | 1/20 | 0.36 |
| ▸ | MMP14 | P50281 | 1/20 | 0.36 |
| ▸ | MMP16 | P51512 | 1/20 | 0.36 |
| ▸ | CASP1 | P29466 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | CA12 | O43570 | 2/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26964273 | 0.87 | MYC (0.41) | TSHRMYCCYP1A2MMP1MMP2 | |
| SCHEMBL6737494 | 0.86 | SMN1; SMN2 (0.42) | TSHRMYCCYP1A2MMP1MMP2 | |
| SCHEMBL27509019 | 0.85 | MYC (0.40) | TSHRMYCCYP1A2GABRA1MMP1 | |
| SCHEMBL780316 | 0.84 | MYC (0.39) | TSHRMYCCYP1A2MMP1MMP2 | |
| SCHEMBL10180789 | 0.83 | TSHR (0.52) | TSHRRORCHDAC4HDAC2HDAC8 | |
| SCHEMBL10180449 | 0.83 | TSHR (0.52) | TSHRRORCHDAC4HDAC2HDAC8 | |
| SCHEMBL15466058 | 0.83 | TSHR (0.44) | TSHRCYP1A2RORCHDAC4HDAC2 | |
| Alcohol SCHEMBL27930449 | 0.81 | HSD11B1 (0.43) | TSHRMYCCYP1A2GABRA1GABRB2 | |
| SCHEMBL10180174 | 0.81 | TSHR (0.46) | TSHRRORCHDAC4HDAC2HDAC8 | |
| SCHEMBL9410797 | 0.80 | RECQL (0.44) | ALDH1A1CA12CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0422879-B1 | Resin compositions having improved antistatic properties | MITSUI TOATSU CHEMICALS (JP) | 1998-02-25 | — | — | EP | claimed |
| US-5151457-A | Styrene polymers and copolymers with polyoxyethylene glycol and methacrylates and sulfonic acids | MITSUI TOATSU CHEMICALS, INC. (JP) | 1992-09-29 | — | — | US | claimed |
| EP-0422879-A1 | Resin compositions having improved antistatic properties | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1991-04-17 | — | — | EP | claimed |
| EP-2692796-A1 | COMPOSITION | Sumitomo Chemical Co., Ltd (JP) | 2014-02-05 | — | — | EP | disclosed |
| US-7498116-B2 | Resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2009-03-03 | — | — | US | disclosed |
| US-7498116-B2 | Resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2009-03-03 | — | — | US | disclosed |
| US-20080241750-A1 | RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080241750-A1 | RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-7189500-B2 | Photothermographic image-recording material | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| EP-1393708-A1 | METHOD OF TREATING HAIR | Kao Corporation (JP) | 2004-03-03 | — | — | EP | disclosed |
| US-20040011373-A1 | Method of treating hair | KAO CORPORATION (JP) | 2004-01-22 | — | — | US | disclosed |
| US-5714534-A | CONSISTS OF A BLEND OF POLYSTYRENE, POLYETHYLENE OXIDE, ACRYLONITRILE-HYDROXYALKYL ACRYLATE OR METHACRYLATE-STYRENE TERPOLYMER, METHACRYLIC ESTER OR ACRYLIC ESTER AND AROMATIC SULFONIC ACID SALT OR ALKYLSULFURIC ACID SALT | MITSUI TOATSU CHEMICALS, INC. (JP) | 1998-02-03 | — | — | US | disclosed |
| EP-0659826-B1 | Antistatic resin compositions | MITSUI TOATSU CHEMICALS (JP) | 1997-09-17 | — | — | EP | disclosed |
| CN-1109078-A | Resin compositions having excellent antistatic properties | MITSUI TOATSU CHEMICALS (JP) | 1995-09-27 | — | — | CN | disclosed |
| EP-0659826-A1 | Antistatic resin compositions | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1995-06-28 | — | — | EP | disclosed |
| EP-0370389-B1 | Nuclear substituted salicylic acids and their salts | SANKO KAIHATSU KAGAKU KENK (JP) | 1994-09-14 | — | — | EP | disclosed |
| US-5151457-A | Styrene polymers and copolymers with polyoxyethylene glycol and methacrylates and sulfonic acids | MITSUI TOATSU CHEMICALS, INC. (JP) | 1992-09-29 | — | — | US | disclosed |
| US-5049685-A | Nuclear substituted salicylic acids and their salts | SANKO KAIHATSU KAGAKU KENKYUSHO (JP) | 1991-09-17 | — | — | US | disclosed |
| EP-0422879-A1 | Resin compositions having improved antistatic properties | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1991-04-17 | — | — | EP | disclosed |
| EP-0370389-A2 | Nuclear substituted salicylic acids and their salts | Sanko Kaihatsu Kagaku Kenkyusho (JP) | 1990-05-30 | — | — | EP | disclosed |