Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 11/20 | 0.85 |
| ▸ | ESR2 | Q92731 | 9/20 | 0.85 |
| ▸ | ACHE | P22303 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.45 |
| ▸ | LMNA | P02545 | 4/20 | 0.42 |
| ▸ | MAPT | P10636 | 3/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | XBP1 | P17861 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | ALOX12 | P18054 | 3/20 | 0.41 |
| ▸ | AR | P10275 | 3/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14667785 | 0.92 | ESR1 (0.73) | ESR1ESR2ACHETDP1TP53 | |
| SCHEMBL464980 | 0.92 | ESR1 (1.00) | ESR1ESR2ACHETDP1TP53 | |
| SCHEMBL29763085 | 0.92 | ESR1 (1.00) | ESR1ESR2ACHETDP1TP53 | |
| SCHEMBL19863505 | 0.92 | ESR1 (0.92) | ESR1ESR2ACHETDP1TP53 | |
| SCHEMBL673869 | 0.90 | ESR1 (1.00) | ESR1ESR2ACHETDP1TP53 | |
| SCHEMBL675104 | 0.90 | ESR1 (1.00) | ESR1ESR2ACHETDP1TP53 | |
| SCHEMBL74159 | 0.90 | ESR1 (1.00) | ESR1ESR2ACHETDP1TP53 | |
| SCHEMBL673904 | 0.90 | ESR1 (1.00) | ESR1ESR2ACHETDP1TP53 | |
| SCHEMBL464963 | 0.90 | ESR1 (1.00) | ESR1ESR2ACHETDP1TP53 | |
| SCHEMBL10776828 | 0.90 | ESR1 (1.00) | ESR1ESR2ACHETDP1TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070106051-A1 | Polyfunctional poly(arylene ether) method | CITIBANK, N.A., AS COLLATERAL AGENT | 2007-05-10 | — | — | US | claimed |
| US-4277600-A | Tetraphenolic compounds and polycarbonates containing the same | GENERAL ELECTRIC COMPANY (US) | 1981-07-07 | — | — | US | claimed |
| EP-2867275-B1 | POLY(PHENYLENE ETHER) PROCESS | SABIC GLOBAL TECHNOLOGIES BV (NL) | 2017-11-22 | — | — | EP | disclosed |
| US-9563121-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition | FUJIFILM CORPORATION (JP) | 2017-02-07 | — | — | US | disclosed |
| US-9563121-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition | FUJIFILM CORPORATION (JP) | 2017-02-07 | — | — | US | disclosed |
| US-9235116-B2 | Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| US-9235116-B2 | Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| US-20140342275-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2014-11-20 | — | — | US | disclosed |
| US-8734693-B2 | Method of separating a poly(arylene ether) composition from a solvent, and poly(arylene ether) composition prepared thereby | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2014-05-27 | — | — | US | disclosed |
| US-8673538-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-03-18 | — | — | US | disclosed |
| US-8574814-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2013-11-05 | — | — | US | disclosed |
| US-20080097069-A1 | POLY(ARYLENE ETHER) METHOD AND COMPOSITION | CITIBANK, N.A., AS COLLATERAL AGENT | 2008-04-24 | — | — | US | disclosed |
| US-7321054-B2 | Method of producing poly(ortho-methylphenol) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2008-01-22 | — | — | US | disclosed |
| US-20070224540-A1 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070224540-A1 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070197832-A1 | METHOD OF PRODUCING POLY(ORTHO-METHYLPHENOL) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2007-08-23 | — | — | US | disclosed |
| US-20070106051-A1 | Polyfunctional poly(arylene ether) method | CITIBANK, N.A., AS COLLATERAL AGENT | 2007-05-10 | — | — | US | disclosed |
| US-20070072117-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-29 | — | — | US | disclosed |
| US-20070072117-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-29 | — | — | US | disclosed |
| US-5856058-A | HALATION INHIBITOR WHICH IS AN ESTERIFICATION PRODUCT BETWEEN A SPECIFIED PHENOLIC COMPOUND AND A NAPHTHOQUINONE-1,2-DIAZIDE SULFONIC ACID. | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-01-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070197832-A1 | METHOD OF PRODUCING POLY(ORTHO-METHYLPHENOL) | COMT, HPD, KDM8 | ESR1 871/4885ESR2 1813/4885ACHE 201/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.