SCHEMBL6734294

SCHEMBL6734294

ClCCCC#CC#CCCCCl

nearest known ligand 0.40

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.40
TDP1 Q9NUW8 2/20 0.40
ALDH1A1 P00352 1/20 0.40
HMGCR P04035 2/20 0.30
PTPN7 P35236 1/20 0.30
CYP3A4 P08684 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11673918 0.85 TSHR (0.46) TSHRTDP1ALDH1A1CYP3A4
SCHEMBL11271214 0.76
SCHEMBL10489497 0.76
SCHEMBL2552240 0.76 TSHR (0.62) TSHRTDP1ALDH1A1HMGCRPTPN7
SCHEMBL17965694 0.76 TSHR (0.55) TSHRTDP1ALDH1A1HMGCRPTPN7
SCHEMBL28613615 0.73
SCHEMBL20767786 0.73
SCHEMBL21252657 0.73
SCHEMBL3989229 0.73
SCHEMBL27216015 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9581504-B2 Freeze, thaw and refreeze indicators based on rapid reactions in the solid state J P Laboratories (US) 2017-02-28 US claimed
US-9163307-B2 Three-dimensional photoresists via functionalization of polymer thin films fabricated by iCVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2015-10-20 US claimed
US-20130260054-A1 Three-Dimensional Photoresists via Functionalization of Polymer Thin Films Fabricated by iCVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2013-10-03 US claimed
WO-2013148126-A1 THREE-DIMENSIONAL PHOTORESISTS VIA FUNCTIONALIZATION OF POLYMER THIN FILMS FABRICATED BY ICVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2013-10-03 WO claimed
WO-2013040384-A1 FREEZE, THAW AND RE-FREEZE INDICATORS BASED ON RAPID REACTIONS IN THE SOLID STATE PATEL GORDHANBHAI N (US) 2013-03-21 WO claimed
US-20130068155-A1 FREEZE, THAW AND REFREEZE INDICATORS BASED ON RAPID REACTIONS IN THE SOLID STATE JP LABORATORIES INC. 2013-03-21 US claimed
US-9581504-B2 Freeze, thaw and refreeze indicators based on rapid reactions in the solid state J P Laboratories (US) 2017-02-28 US disclosed
US-9163307-B2 Three-dimensional photoresists via functionalization of polymer thin films fabricated by iCVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2015-10-20 US disclosed
US-20130260054-A1 Three-Dimensional Photoresists via Functionalization of Polymer Thin Films Fabricated by iCVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2013-10-03 US disclosed
WO-2013148126-A1 THREE-DIMENSIONAL PHOTORESISTS VIA FUNCTIONALIZATION OF POLYMER THIN FILMS FABRICATED BY ICVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2013-10-03 WO disclosed
WO-2013040384-A1 FREEZE, THAW AND RE-FREEZE INDICATORS BASED ON RAPID REACTIONS IN THE SOLID STATE PATEL GORDHANBHAI N (US) 2013-03-21 WO disclosed
US-20130068155-A1 FREEZE, THAW AND REFREEZE INDICATORS BASED ON RAPID REACTIONS IN THE SOLID STATE JP LABORATORIES INC. 2013-03-21 US disclosed
US-6686428-B2 TRANSMETALLATION REAGENTS REACTED WITH ALPHA-HALOCARBONYL COMPOUNDS IN THE PRESENCE OF A METAL CATALYST THE PENN STATE RESEARCH FOUNDATION 2004-02-03 US disclosed