⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11659135 | 0.97 | — | — | |
| SCHEMBL5326446 | 0.75 | — | — | |
| SCHEMBL127420 | 0.72 | — | — | |
| SCHEMBL10402953 | 0.71 | — | — | |
| SCHEMBL10402743 | 0.69 | PLA2G1B (0.30) | — | |
| SCHEMBL7871008 | 0.69 | — | — | |
| SCHEMBL6417555 | 0.69 | — | — | |
| SCHEMBL10403875 | 0.69 | — | — | |
| SCHEMBL15789288 | 0.69 | — | — | |
| SCHEMBL10403782 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| US-11480877-B2 | Resist composition, method for forming resist pattern, and polyphenol compound used therein | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-10-25 | — | — | US | disclosed |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-08 | — | — | US | disclosed |
| CN-107428646-B | Compounds, resins, and methods for their purification, and uses thereof | 三菱瓦斯化学株式会社 | 2021-03-02 | — | — | CN | disclosed |
| US-8765804-B2 | Pharmaceutical compositions comprising lignans and their derivatives for treating hyperplastic diseases | UNIVERSITÄT INNSBRUCK (AT) | 2014-07-01 | — | — | US | disclosed |
| US-6680300-B2 | FOR CANCER THERAPY | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM | 2004-01-20 | — | — | US | disclosed |
| US-20030023052-A1 | Methods and compositions for the manufacture of highly potent anthracycline-based antitumor agents | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM | 2003-01-30 | — | — | US | disclosed |
| CN-1100165-C | Improved regenerated collagen fiber and method of manufacturing the same | KANEGAFUCHI CHEMICAL IND (JP) | 2003-01-29 | — | — | CN | disclosed |
| EP-0890663-B1 | Improved regenerated collagen fiber and method of manufacturing the same | KANEKA CORP (JP) | 2002-11-13 | — | — | EP | disclosed |
| WO-2000026223-A9 | METHODS AND COMPOSITIONS FOR THE MANUFACTURE OF HIGHLY POTENT ANTHRACYCLINE-BASED ANTITUMOR AGENTS | UNIV TEXAS (US) | 2002-08-22 | — | — | WO | disclosed |
| US-6437105-B1 | SIDE EFFECT REDUCTION; CYTOTOXICITY; OVERCOMES MULTI-DRUG RESISTANCE | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM | 2002-08-20 | — | — | US | disclosed |
| US-6160096-A | Regenerated collagen fiber and method of manufacturing the same | KANEKA CORPORATION (JP) | 2000-12-12 | — | — | US | disclosed |
| WO-2000026223-A2 | METHODS AND COMPOSITIONS FOR THE MANUFACTURE OF HIGHLY POTENT ANTHRACYCLINE-BASED ANTITUMOR AGENTS | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2000-05-11 | — | — | WO | disclosed |
| CN-1207422-A | Improved regenerated collagen fiber and method of manufacturing the same | KANEGAFUCHI CHEMICAL IND (JP) | 1999-02-10 | — | — | CN | disclosed |
| EP-0890663-A2 | Improved regenerated collagen fiber and method of manufacturing the same | Kaneka Corporation (JP) | 1999-01-13 | — | — | EP | disclosed |