SCHEMBL5326446

SCHEMBL5326446

CCCC(I)C=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28553161 0.83
SCHEMBL11144441 0.81
SCHEMBL127420 0.81
SCHEMBL3915700 0.79 ADH1B (0.47)
SCHEMBL29380140 0.79 ADH1B (0.47)
SCHEMBL29380352 0.79 ADH1B (0.47)
SCHEMBL29380868 0.79 ADH1B (0.47)
SCHEMBL14601128 0.75 TSHR (0.31)
SCHEMBL6740723 0.75
SCHEMBL15034381 0.75 TSHR (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6184374-B1 DOXORUBICIN OR ITS DAUNOSAMINE MODIFIED DERIVATIVES LINKED COVALENTLY TO ANALOGS OF PEPTIDE HORMONES SUCH AS LH-RH, BOMBESIN AND SOMATOSTATIN. TREATING SAID HYDROXY AMINE WITH AN EXCESS OF A HALOALDEHYDE, THE ADMINISTRATORS OF THE TULANE EDUCATIONAL FUND 2001-02-06 US claimed
US-11572430-B2 Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-02-07 US disclosed
US-11480877-B2 Resist composition, method for forming resist pattern, and polyphenol compound used therein MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-10-25 US disclosed
US-11243467-B2 Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-02-08 US disclosed
EP-1862450-A2 Novel compounds KARO BIO AB (SE) 2007-12-05 EP disclosed
CN-100347152-C Benzamide or phenylacetamide derivatives useful as thyroid receptor ligands KAROBIO AB (SE) 2007-11-07 CN disclosed
US-7153997-B2 Benzamide derivatives as thyroid receptor ligands KARO BIO AB (SE) 2006-12-26 US disclosed
US-20060135614-A1 Novel compounds NORIN, THOMAS ANDERS WILSON (SE) 2006-06-22 US disclosed
CN-1668579-A Benzamide or phenylacetamide derivatives useful as thyroid receptor ligands KAROBIO AB (SE) 2005-09-14 CN disclosed
EP-1537073-A2 BENZAMIDE OR PHENYLACETAMIDE DERIVATIVES USEFUL AS THYROID RECEPTOR LIGANDS KARO BIO AB (SE) 2005-06-08 EP disclosed
WO-2004007430-A2 BENZAMIDE OR PHENYLACETAMIDE DERIVATIVES USEFUL AS THYROID RECEPTOR LIGANDS KARO BIO AB (SE) 2004-01-22 WO disclosed
US-3931331-A PLANT PROTECTION INTERMEDIATES ALLIED CHEMICAL CORPORATION (US) 1976-01-06 US disclosed