Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 1/20 | 0.61 |
| ▸ | CA1 | P00915 | 1/20 | 0.61 |
| ▸ | CA2 | P00918 | 1/20 | 0.61 |
| ▸ | GLA | P06280 | 1/20 | 0.61 |
| ▸ | CA3 | P07451 | 1/20 | 0.61 |
| ▸ | CA4 | P22748 | 1/20 | 0.61 |
| ▸ | CA9 | Q16790 | 1/20 | 0.61 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.61 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.61 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | PDCD1 | Q15116 | 1/20 | 0.45 |
| ▸ | CD274 | Q9NZQ7 | 1/20 | 0.45 |
| ▸ | MMP3 | P08254 | 1/20 | 0.43 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.43 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.43 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.42 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.41 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phenol SCHEMBL30853591 | 1.00 | CA12 (0.61) | CA12CA1CA2GLACA3 | |
| Naphthalene SCHEMBL28841559 | 0.93 | TDP1 (0.52) | CA12CA1CA2GLACA3 | |
| Salicyl Alcohol SCHEMBL3308858 | 0.87 | HSPA5 (0.54) | CA12CA1CA2GLACA3 | |
| Salicyl Alcohol SCHEMBL5732281 | 0.87 | HSPA5 (0.54) | CA12CA1CA2GLACA3 | |
| Salicyl Alcohol SCHEMBL1077529 | 0.87 | HSPA5 (0.54) | CA12CA1CA2GLACA3 | |
| SCHEMBL29366632 | 0.85 | APOBEC3G (0.60) | TDP1APOBEC3GTSHRPDCD1CD274 | |
| SCHEMBL41139 | 0.85 | APOBEC3G (0.60) | TDP1APOBEC3GTSHRPDCD1CD274 | |
| Phenol SCHEMBL3695147 | 0.84 | PDCD1 (0.57) | CA12CA1CA2GLACA3 | |
| Phenol SCHEMBL28663409 | 0.84 | PDCD1 (0.57) | CA12CA1CA2GLACA3 | |
| Phenol SCHEMBL4107850 | 0.79 | CA2 (0.73) | CA12CA1CA2GLACA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 198 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115650886-A | Oxime sulfonate photoacid generators and use of resist compositions | 瑞红(苏州)电子化学品股份有限公司 | 2023-01-31 | — | — | CN | claimed |
| CN-115611782-A | High-acid-production oxime sulfonate photoacid generator and application of resist composition thereof | 瑞红(苏州)电子化学品股份有限公司 | 2023-01-17 | — | — | CN | claimed |
| US-20190241698-A1 | HARDENER COMPOSITION AND ASSOCIATED FORMING METHOD, UNCURED AND CURED EPOXY RESIN COMPOSITIONS, AND ARTICLE | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2019-08-08 | — | — | US | claimed |
| US-20180319930-A1 | METHOD OF FORMING A CURED EPOXY MATERIAL, CURED EPOXY MATERIAL FORMED THEREBY, PHENYLENE ETHER OLIGOMER-ANHYDRIDE REACTION PRODUCT USEFUL IN THE METHOD, AND COMPOSITE CORE INCORPORATING THE CURED EPOXY MATERIAL | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2018-11-08 | — | — | US | claimed |
| EP-3377315-A1 | METHOD OF FORMING A CURED EPOXY MATERIAL, CURED EPOXY MATERIAL FORMED THEREBY, PHENYLENE ETHER OLIGOMER-ANHYDRIDE REACTION PRODUCT USEFUL IN THE METHOD, AND COMPOSITE CORE INCORPORATING THE CURED EPOXY MATERIAL | SABIC Global Technologies B.V. (NL) | 2018-09-26 | — | — | EP | claimed |
| CN-114516863-B | Imide sulfonate photoacid generator with high acid yield, composition and application | 常州强力电子新材料股份有限公司 | 2024-06-21 | — | — | CN | disclosed |
| WO-2024128017-A1 | SULFONIUM SALT, ACID GENERATING AGENT, AND PHOTORESIST | サンアプロ株式会社 | 2024-06-20 | — | — | WO | disclosed |
| CN-118064022-A | Optical filter and composition | JSR株式会社 | 2024-05-24 | — | — | CN | disclosed |
| US-11990396-B2 | Substrate and method for manufacturing the same | RESONAC CORPORATION (JP) | 2024-05-21 | — | — | US | disclosed |
| WO-2024100964-A1 | ORGANOMETALLIC COMPOUND, SULFONIUM SALT-TYPE COMPOUND, NONION OXIME-TYPE COMPOUND, PHOTOSENSITIVE MATERIAL, ACID GENERATOR, AND PHOTORESIST | サンアプロ株式会社 | 2024-05-16 | — | — | WO | disclosed |
| CN-115368285-B | oxime sulfonate photoacid generator with high acid yield | 常州强力先端电子材料有限公司 | 2024-03-26 | — | — | CN | disclosed |
| CN-115368286-B | Oxime sulfonate photoacid generator with high acid yield | 常州强力先端电子材料有限公司 | 2024-03-22 | — | — | CN | disclosed |
| US-20070080330-A1 | Flame retardant composition and method | CITIBANK, N.A., AS COLLATERAL AGENT | 2007-04-12 | — | — | US | disclosed |
| US-20070042296-A1 | POSITIVE PHOTOSENSITIVE INSULATING RESIN COMPOSITION, CURED PRODUCT THEREOF, AND ELECTRONIC COMPONENT | JSR CORPORATION (JP) | 2007-02-22 | — | — | US | disclosed |
| EP-1755365-A1 | Positive photosensitive insulating resin composition, cured product thereof, and electronic component | JSR Corporation (JP) | 2007-02-21 | — | — | EP | disclosed |
| EP-1753278-A1 | MULTILAYER PRINTED WIRING BOARD | Ibiden Co., Ltd. (JP) | 2007-02-14 | — | — | EP | disclosed |
| US-20060245139-A1 | Package substrate with built-in capacitor and manufacturing method thereof | IBIDEN CO., LTD. (JP) | 2006-11-02 | — | — | US | disclosed |
| EP-1696716-A1 | MULTILAYER PRINTED WIRING BOARD | IBIDEN CO., LTD. (JP) | 2006-08-30 | — | — | EP | disclosed |
| US-20060137905-A1 | Multilayer printed wiring board | IBIDEN CO., LTD. (US) | 2006-06-29 | — | — | US | disclosed |
| US-20040110084-A1 | Photosensitive insulating resin composition and cured product thereof | JSR CORPORATION (JP) | 2004-06-10 | — | — | US | disclosed |