Diphenylsulfane

Diphenylsulfane

SCHEMBL674158

O=S(=O)(Oc1ccc(F)cc1)C(F)(F)F.c1ccc(Sc2ccccc2)cc1

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
STS P08842 1/20 0.44
CA1 P00915 6/20 0.38
CA2 P00918 6/20 0.38
CA12 O43570 2/20 0.38
CA7 P43166 1/20 0.38
CA13 Q8N1Q1 1/20 0.38
FFAR1 O14842 2/20 0.38
FFAR4 Q5NUL3 1/20 0.38
CXCR2 P25025 2/20 0.38
ALDH1A1 P00352 2/20 0.37
GAA P10253 1/20 0.37
PTGS2 P35354 2/20 0.37
PTGS1 P23219 1/20 0.37
CXCR1 P25024 1/20 0.37
GLA P06280 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
CA9 Q16790 5/20 0.36
NR3C1 P04150 1/20 0.36
SOS1 Q07889 1/20 0.35
MEN1 O00255 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2569852 0.91 STS (0.53) STSCA1CA2CA12CA7
Diphenylsulfane SCHEMBL673319 0.91 STS (0.53) STSCA1CA2CA12CA7
Diphenylsulfane SCHEMBL672234 0.87 CA1 (0.51) STSCA1CA2CA12FFAR1
Biphenyl SCHEMBL21461722 0.87 STS (0.49) STSCA1CA2CA12CA7
SCHEMBL776070 0.86 CXCR2 (0.45) CA1CA2CA12CA7FFAR1
Diphenylsulfane SCHEMBL5698067 0.85 CA1 (0.44) STSCA1CA2CA12CA7
Diphenylsulfane SCHEMBL672139 0.85 PPARG (0.45) STSCA1CA2FFAR1CXCR2
Diphenylsulfane SCHEMBL3275151 0.85 CA1 (0.44) STSCA1CA2CA12CA7
Diphenylsulfane SCHEMBL1593269 0.85 NFE2L2 (0.45) STSCA1CA2CXCR2GAA
Biphenyl SCHEMBL17420890 0.85 STS (0.47) STSCA1CA2CA12CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12232338-B2 Low-voltage operation dual-gate organic thin-film transistors and methods of manufacturing thereof CORNING INCORPORATED (US) 2025-02-18 US claimed
CN-111045296-B UV patternable polymer blend for organic thin film transistor 康宁股份有限公司 2024-12-27 CN claimed
US-20220209149-A1 LOW-VOLTAGE OPERATION DUAL-GATE ORGANIC THIN-FILM TRANSISTORS AND METHODS OF MANUFACTURING THEREOF UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KP) 2022-06-30 US claimed
WO-2020231710-A1 LOW-VOLTAGE OPERATION DUAL-GATE ORGANIC THIN-FILM TRANSISTORS AND METHODS OF MANUFACTURING THEREOF CORNING INCORPORATED (US) 2020-11-19 WO claimed
WO-2020197732-A1 PHOTO-PATTERNABLE CROSS-BRED ORGANIC SEMICONDUCTOR POLYMERS FOR ORGANIC THIN-FILM TRANSISTORS CORNING INCORPORATED (US) 2020-10-01 WO claimed
EP-3079677-A1 PHOTOPOLYMERIZABLE LIQUID COMPOSITION Laboratoires Urgo (FR) 2016-10-19 EP claimed
WO-2015087020-A1 PHOTOPOLYMERIZABLE LIQUID COMPOSITION LABORATOIRES URGO (FR) 2015-06-18 WO claimed
WO-2025035415-A1 SOLVENT-FREE HIGH REFRACTIVE INDEX UV CURABLE EPOXY INK COMPOSITIONS DOW GLOBAL TECHNOLOGIES LLC (US) 2025-02-20 WO disclosed
US-12232338-B2 Low-voltage operation dual-gate organic thin-film transistors and methods of manufacturing thereof CORNING INCORPORATED (US) 2025-02-18 US disclosed
CN-119300613-A Perovskite solar cell and preparation method and application thereof 天合光能股份有限公司 2025-01-10 CN disclosed
US-12187065-B2 Security devices Optrical Limited (GB) 2025-01-07 US disclosed
CN-111045296-B UV patternable polymer blend for organic thin film transistor 康宁股份有限公司 2024-12-27 CN disclosed
US-20240334806-A1 UV PATTERNABLE POLYMER BLENDS FOR ORGANIC THIN-FILM TRANSISTORS CORNING INCORPORATED 2024-10-03 US disclosed
US-20130109261-A1 COATING SYSTEMS CAPABLE OF FORMING AMBIENTLY CURED HIGHLY DURABLE HYDROPHOBIC COATINGS ON SUBSTRATES LUNA INNOVATIONS (US) 2013-05-02 US disclosed
CN-103000723-A Solar cell MOTECH IND INC 2013-03-27 CN disclosed
WO-2012024005-A2 COATING SYSTEMS CAPABLE OF FORMING AMBIENTLY CURED HIGHLY DURABLE HYDROPHOBIC COATINGS ON SUBSTRATES LUNA INNOVATIONS INCORPORATED (US) 2012-02-23 WO disclosed
US-7217492-B2 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2007-05-15 US disclosed
US-7147801-B2 Ink jet ink composition and method for security marking VIDEOJET TECHNOLOGIES INC. (US) 2006-12-12 US disclosed
EP-1601729-B1 INK JET INK COMPOSITION AND METHOD FOR SECURITY MAKING VIDEOJET TECHNOLOGIES INC (US) 2006-06-21 EP disclosed
US-20050053861-A1 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2005-03-10 US disclosed