SCHEMBL6741729

SCHEMBL6741729

FC(F)(F)C(C=Cc1ccccc1)C(F)(F)F

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 3/20 0.44
NFE2L2 Q16236 4/20 0.43
CYP1A2 P05177 2/20 0.42
CA1 P00915 1/20 0.41
GABBR2 O75899 1/20 0.39
GABRB1 P18505 1/20 0.39
GABRB2 P47870 1/20 0.39
GABBR1 Q9UBS5 1/20 0.39
ALDH1A1 P00352 2/20 0.38
LMNA P02545 2/20 0.38
CYP19A1 P11511 1/20 0.38
MAOA P21397 1/20 0.38
TRPA1 O75762 1/20 0.38
ALOX5 P09917 1/20 0.38
MAPK1 P28482 1/20 0.38
CYP1A1 P04798 1/20 0.37
CYP1B1 Q16678 1/20 0.37
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
HDAC3 O15379 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6513856 0.78 GABBR2 (0.50) MAOBNFE2L2CYP1A2CA1GABBR2
SCHEMBL8973181 0.78 GABBR2 (0.50) MAOBNFE2L2CYP1A2CA1GABBR2
SCHEMBL8404223 0.78 GABBR2 (0.50) MAOBNFE2L2CYP1A2CA1GABBR2
SCHEMBL6513848 0.78 GABBR2 (0.50) MAOBNFE2L2CYP1A2CA1GABBR2
SCHEMBL8972865 0.78 GABBR2 (0.50) MAOBNFE2L2CYP1A2CA1GABBR2
SCHEMBL23683764 0.78 HTR2A (0.41) MAOBNFE2L2CYP1A2GABBR2GABRB1
SCHEMBL8973184 0.78 GABBR2 (0.50) MAOBNFE2L2CYP1A2CA1GABBR2
SCHEMBL11397403 0.78 HTR2A (0.41) MAOBNFE2L2CYP1A2GABBR2GABRB1
SCHEMBL8972871 0.78 GABBR2 (0.50) MAOBNFE2L2CYP1A2CA1GABBR2
SCHEMBL8521687 0.73 MAOB (0.50) MAOBNFE2L2CYP1A2CA1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6680157-B1 MIXING WITH AROMATIC COMPOUND MASSACHUSETTS INSTITUTE OF TECHNOLOGY 2004-01-20 US disclosed
WO-2002031598-A2 RESIST METHODS AND MATERIALS FOR UV AND ELECTRON-BEAM LITHOGRAPHY WITH REDUCED OUTGASSING MASSACHUSETTS INSTITUTE OF TECHNOLOGY, INC. (US) 2002-04-18 WO disclosed