SCHEMBL674226

SCHEMBL674226

CCC(OC)[Si](OC)(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4827272 0.82 TSHR (0.30)
SCHEMBL6865920 0.78
SCHEMBL6557411 0.78 THRB (0.36)
SCHEMBL28428861 0.78
SCHEMBL3735040 0.78
SCHEMBL1978761 0.78
SCHEMBL29263957 0.76
SCHEMBL20567507 0.76
SCHEMBL9061814 0.76
SCHEMBL6547500 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 155 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4626596-A1 FLOW CELLS WITH PASSIVATION COMPONENTS Illumina, Inc. (US) 2025-10-08 EP claimed
CN-119875506-A Super-hydrophobic coating with radiation refrigeration function 国网重庆市电力公司电力科学研究院 2025-04-25 CN claimed
CN-119372625-A Process and apparatus for radical enhanced vapor deposition ASM IP私人控股有限公司 2025-01-28 CN claimed
US-20250029831-A1 PROCESS AND APPARATUS FOR RADICAL ENHANCED VAPOR DEPOSITION ASM IP HOLDING B.V. (NL) 2025-01-23 US claimed
CN-119010652-A Method for improving water evaporation power generation performance and stability 常州宇氧生物科技有限公司 2024-11-22 CN claimed
US-20240191292-A1 FLOW CELLS WITH PASSIVATION COMPONENTS ILLUMINA, INC. 2024-06-13 US claimed
WO-2024118811-A1 FLOW CELLS WITH PASSIVATION COMPONENTS ILLUMINA, INC. (US) 2024-06-06 WO claimed
CN-117658559-A Method for preparing high-performance concrete by using building waste recycled aggregate 三亚瑞泽再生资源利用有限公司 2024-03-08 CN claimed
CN-114105490-B Low-emissivity coated glass 福耀玻璃工业集团股份有限公司 2022-11-29 CN claimed
CN-114105490-A Low-emissivity coated glass 福耀玻璃工业集团股份有限公司 2022-03-01 CN claimed
CN-1166734-C Modified methyl acrylic high polymer/inorganic composite material and its preparation method and application 中国科学院广州化学研究所 2004-09-15 CN claimed
US-20030178139-A1 Protective coatings for improved tarnish resistance in metal foils NIKKO MATERIALS USA, INC. 2003-09-25 US claimed
US-6589381-B2 Contacting copper foil with an inert silane, titanate or zirconate compound to form a resin dust resistant film, laminating metal foil to a resin selected from polyimde, polyester or epoxy resin GOULD ELECTRONICS, INC. 2003-07-08 US claimed
US-6537675-B1 Protective film of at least one inert silane, titanate or zirconate overlying the first side of the metal foil; and a metal sheet having a first side and a second side, the first side overlying the protective film GA-TEK, INC. 2003-03-25 US claimed
CN-1341682-A Modified methyl acrylic high polymer/inorganic composite material and its preparation method and application GUANGZHOU INST OF CHEMISTRY (CN) 2002-03-27 CN claimed
CN-1341683-A Polyacrylonitrile/inorganic composite material, its preparation method and application GUANGZHOU INST OF CHEMISTRY (CN) 2002-03-27 CN claimed
US-6299721-B1 CONTACTING FIRST SIDE OF METAL FOIL WITH SOLUTION COMPRISING HYDROCARBYLSILANE, WATER, ORGANIC SOLVENT AND TRIAZOLE COMPOUND TO FORM RESIN DUST RESISTANT FILM ON SURFACE OF METAL GOULD ELECTRONICS INCL 2001-10-09 US claimed
US-20010015257-A1 Coatings for improved resin dust resistance NIKKO MATERIALS USA, INC. 2001-08-23 US claimed
EP-1011299-A2 Coatings for improved resin dust resistance GA-TEK Inc. (US) 2000-06-21 EP claimed
CN-1256974-A Paint for improving resin stive property CAB TEC INC (US) 2000-06-21 CN claimed