⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL48111 | 0.93 | — | — | |
| SCHEMBL30974715 | 0.86 | — | — | |
| Hydrochloric Acid SCHEMBL3550501 | 0.86 | ALDH1A1 (0.62) | — | |
| SCHEMBL27790229 | 0.86 | — | — | |
| Ammonia Solution, Strong SCHEMBL1863656 | 0.86 | — | — | |
| Hydrochloric Acid SCHEMBL3550507 | 0.86 | — | — | |
| SCHEMBL28059945 | 0.86 | — | — | |
| SCHEMBL2518015 | 0.86 | — | — | |
| Isopropyl Alcohol SCHEMBL20607567 | 0.86 | ALDH1A1 (0.86) | — | |
| Water SCHEMBL28161990 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3843946-A1 | HYBRID CMP CONDITIONING HEAD | Best Engineered Surface Technologies, LLC (US) | 2021-07-07 | — | — | EP | disclosed |
| US-20210187696-A1 | HYBRID CMP CONDITIONING HEAD | BEST ENGINEERED SURFACE TECHNOLOGIES, LLC | 2021-06-24 | — | — | US | disclosed |
| US-6818029-B2 | FORMING GEOMETRICAL PROTRUSIONS OF UNIFORM HEIGHT AND COATING WITH DIAMOND LAYER | HUNATECH CO., LTD. (KR) | 2004-11-16 | — | — | US | disclosed |
| US-6699106-B2 | PREVENTING DEFECTS; CHEMICAL MECHANICAL POLISHING WITHOUT USE OF HIGH PRESSURE; FORMING CROSSED DITCH STRIPS AND UNIFORM THICKNESS DIAMOND COATING | HUNATECH CO., LTD. (KR) | 2004-03-02 | — | — | US | disclosed |
| US-20030114094-A1 | Conditioner for polishing pad and method for manufacturing the same | HUNATECH CO., LTD. | 2003-06-19 | — | — | US | disclosed |
| US-20030036341-A1 | Conditioner for polishing pad and method for manufacturing the same | HUNATECH CO., LTD. | 2003-02-20 | — | — | US | disclosed |
| US-6439986-B1 | Conditioner for polishing pad and method for manufacturing the same | HUNATECH CO., LTD. (KR) | 2002-08-27 | — | — | US | disclosed |
| WO-2001026862-A1 | CONDITIONER FOR POLISHING PAD AND METHOD FOR MANUFACTURING THE SAME | HUNATECH CO., LTD. (KR) | 2001-04-19 | — | — | WO | disclosed |