SCHEMBL67480

SCHEMBL67480

C=C(C)C(=O)Oc1cccc2ccccc12

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.60
HSD17B10 Q99714 3/20 0.60
GAA P10253 2/20 0.60
PGR P06401 1/20 0.60
PTGS1 P23219 1/20 0.60
MAPK1 P28482 1/20 0.60
KMT2A Q03164 3/20 0.54
MEN1 O00255 1/20 0.54
RAB9A P51151 1/20 0.54
L3MBTL1 Q9Y468 1/20 0.54
KDM4E B2RXH2 3/20 0.50
HPGD P15428 2/20 0.49
TDP1 Q9NUW8 1/20 0.49
MMP2 P08253 1/20 0.48
FABP7 O15540 4/20 0.47
FABP3 P05413 4/20 0.47
FABP5 Q01469 4/20 0.47
BCHE P06276 1/20 0.47
SLC6A3 Q01959 1/20 0.47
ELANE P08246 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29373404 1.00 ALDH1A1 (0.60) ALDH1A1HSD17B10GAAPGRPTGS1
Methacrylic Acid SCHEMBL3165127 0.95 ALDH1A1 (0.55) ALDH1A1HSD17B10GAAPGRPTGS1
Isobutane SCHEMBL28204777 0.95 ALDH1A1 (0.55) ALDH1A1HSD17B10GAAPGRPTGS1
Sulfuric Acid SCHEMBL3802923 0.94 ALDH1A1 (0.54) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL10735212 0.92 ELANE (0.55) ALDH1A1HSD17B10GAAPGRPTGS1
Acrylic Acid SCHEMBL28215232 0.91 ALDH1A1 (0.51) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL13374668 0.90 ALDH1A1 (0.50) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL29733205 0.90 ALDH1A1 (0.50) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL29617400 0.90 ALDH1A1 (0.50) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL27100742 0.90 ALDH1A1 (0.50) ALDH1A1HSD17B10GAAPGRPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 4100 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2026106292-A1 DISPERSION COMPRISING CARBON MATERIAL, AND LITHIUM SULFIDE SECONDARY BATTERY USING SAME 주식회사 한솔케미칼 2026-05-21 WO claimed
EP-4700084-A1 COPOLYMER, DISPERSION PREPARED USING SAME, POSITIVE ELECTRODE FOR SECONDARY BATTERY MANUFACTURED USING DISPERSION, AND SECONDARY BATTERY COMPRISING POSITIVE ELECTRODE Hansol Chemical Co., Ltd (KR) 2026-02-25 EP claimed
US-20260049167-A1 COPOLYMER, DISPERSION PREPARED USING SAME, POSITIVE ELECTRODE FOR SECONDARY BATTERY MANUFACTURED USING DISPERSION, AND SECONDARY BATTERY INCLUDING POSITIVE ELECTRODE HANSOL CHEMICAL CO LTD (KR) 2026-02-19 US claimed
US-20260040695-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER NEWSOUTH INNOVATIONS PTY LTD (AU) 2026-02-05 US claimed
US-20250223453-A1 PHOTOCURABLE COMPOSITION CANON KK (JP) 2025-07-10 US claimed
US-20250198980-A1 COMBINATORIAL HIGH-THROUGHPUT SCREENING OF COMPLEX POLYMERIC ENZYME IMMOBILIZATION SUPPORTS THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) 2025-06-19 US claimed
EP-4562077-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER NewSouth Innovations Pty Limited (AU) 2025-06-04 EP claimed
CN-116510698-B Adsorption material and preparation method and application thereof 中国石油化工股份有限公司 2025-06-03 CN claimed
CN-119944053-A Polymer solid electrolyte battery with hydrogen bond structure and preparation method thereof 江西理工大学 2025-05-06 CN claimed
WO-2025089819-A1 COPOLYMER, VISCOSITY REDUCER AND CATHODE SLURRY COMPOSITION EACH COMPRISING COPOLYMER, CATHODE COMPRISING CATHODE SLURRY COMPOSITION, AND SECONDARY BATTERY COMPRISING CATHODE 주식회사 한솔케미칼 2025-05-01 WO claimed
US-5305126-A Polymer-dispersed liquid crystal material with in-situ polymerized liquid crystal polymer grains dispersed in a layer of liquid crystal material sealed between substrates and field electrodes SEIKO EPSON CORPORATION (JP) 1994-04-19 US claimed
EP-0589340-A1 Urea-modified copolymers as dispersants for pigments in coating compositions BASF CORPORATION (US) 1994-03-30 EP claimed
US-5270399-A Urea-modified copolymers as dispersants for pigments in coating compositions BASF CORPORATION (US) 1993-12-14 US claimed
US-5139882-A Copolymer of acrylic acid ester, acrylic acid aromatic ester, and optionally carboxylic acid or ureido compound ROHM GMBH CHEMISCHE FABRIK (DE) 1992-08-18 US claimed
US-4564263-A ALKYLMETHACRYLATE POLYMER CLAD WITH FLUOROPOLYMER AND IRRADIATED SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1986-01-14 US claimed
US-4522993-A COPOLYMER HAVING UNITS FROM A BIS-ALLYL HALOGENATED BENZENE DICARBOXYLATE MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1985-06-11 US claimed
US-4369298-A Novel cured resin, process for production thereof, and lens composed of said resin from bis(alkyleneoxyphenyl)-diacrylate, bis(alkyleneoxyphenyl)diallyl ether, bis(alkyleneoxyphenyl)diallyl carbonate monomers TOKUYAMA SODA KABUSHIKI KAISHA (JP) 1983-01-18 US claimed
US-4087574-A PHOTOGRAPHY, VINYL OR VINYLIDENE CHLORIDE POLYMERS FUJI PHOTO FILM CO., LTD. (JA) 1978-05-02 US claimed
US-4008083-A Stabilization of color images formed by photomodulation of the Christiansen effect E. I. DU PONT DE NEMOURS AND COMPANY (US) 1977-02-15 US claimed
US-3951520-A Color imaging using the Christiansen effect E. I. DU PONT DE NEMOURS AND COMPANY (US) 1976-04-20 US claimed