SCHEMBL6753479

SCHEMBL6753479

CCCCC1CCC(S(=O)(=O)CS(=O)(=O)C2CCC(CCCC)CC2)CC1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 3/20 0.48
POLB P06746 1/20 0.41
HPGD P15428 1/20 0.41
HTT P42858 2/20 0.41
LMNA P02545 1/20 0.41
MAPK1 P28482 1/20 0.41
MAPT P10636 2/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
PKM P14618 1/20 0.37
TP53 P04637 1/20 0.35
ALDH1A1 P00352 1/20 0.34
GAA P10253 1/20 0.33
NAAA Q02083 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
EPHX1 P07099 1/20 0.31
LSS P48449 2/20 0.31
GNAI3 P08754 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6753550 0.94 HTT (0.45) CYP1A2POLBHPGDHTTLMNA
SCHEMBL6755834 0.88 CYP2C9 (0.34) CYP1A2POLBHPGDHTTLMNA
SCHEMBL12735659 0.80 CYP1A2 (0.39) CYP1A2POLBHPGDHTTLMNA
SCHEMBL11362435 0.80 POLB (0.49) CYP1A2POLBHPGDHTTLMNA
SCHEMBL10569321 0.78 CYP1A2 (0.67) CYP1A2POLBHPGDHTTLMNA
SCHEMBL10569310 0.78 CYP1A2 (0.67) CYP1A2POLBHPGDHTTLMNA
SCHEMBL97616 0.78
SCHEMBL5691762 0.78 CYP1A2 (0.74) CYP1A2POLBHPGDHTTLMNA
SCHEMBL19733484 0.77 HTT (0.51) CYP1A2POLBHPGDHTTLMNA
Formaldehyde SCHEMBL28532351 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6713612-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-03-30 US disclosed
US-20030224298-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-12-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030224298-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process VEGFA, DNMT3A, PIM3 CYP1A2 1601/4885POLB 234/4885HPGD 4560/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.